Inventor · disambiguated record
David J. Sturtevant
Also filed as: STURTEVANT DAVID · STURTEVANT DAVID J · STURTEVANT DAVID JOHN
10 granted patents·3 pending applications·29 citations·filing 2003–2023
84Inventor score
Top patents by PatentIndex Score
13 records- 0184US8256366B2Small watercraft boatliftIMEL DUSTIN·Filed 2009·Granted Sep 4, 2012·13 cites·18 claims
- 0277US9051035B2Bench system for small watercraft boatliftIMEL DUSTIN·Filed 2010·Granted Jun 9, 2015·5 cites·28 claims
- 0365US9708038B2Boat entry assistance systemE-Z-DOCK INC·Filed 2016·Granted Jul 18, 2017·1 cites·12 claims
- 0465US7312880B2Wafer edge structure measurement methodLSI CORP·Filed 2004·Granted Dec 25, 2007·7 cites·12 claims
- 0555US7638245B2Mask set for variable mask field exposureLSI CORP·Filed 2008·Granted Dec 29, 2009·0 cites·5 claims
- 0652US11970253B1Boat lift assemblyGREAT LAKES LIFT INC·Filed 2023·Granted Apr 30, 2024·0 cites·16 claims
- 0749US7930655B2Yield profile manipulatorLSI CORP·Filed 2008·Granted Apr 19, 2011·0 cites·8 claims
- 0849US7018753B2Variable mask field exposureLSI LOGIC CORP·Filed 2003·Granted Mar 28, 2006·2 cites·3 claims
- 0949US2015183492A1Small watercraft boatliftE Z DOCK INC·Filed 2015·Application pending·0 cites
- 1048US2006093965A1Variable mask field exposureLSI LOGIC CORP·Filed 2005·Application pending·0 cites
- 1143US7395522B2Yield profile manipulatorLSI CORP·Filed 2004·Granted Jul 1, 2008·0 cites·12 claims
- 1238US8685633B2Method for optimizing wafer edge patterningBARBER DUANE B·Filed 2004·Granted Apr 1, 2014·1 cites·1 claims
- 1336US2006127823A1Multi reticle exposuresLSI LOGIC CORP·Filed 2004·Application pending·0 cites
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