Inventor
GURUSAMY JAY
US38 patents
⚠️ This page may combine multiple inventors who share the name “GURUSAMY JAY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
35 patentsUS11759911B2Sep 19, 2023
Carrier head with segmented substrate chuck
APPLIED MATERIALS INC1 citations73
US11623321B2Apr 11, 2023
Polishing head retaining ring tilting moment control
APPLIED MATERIALS INC2 citations73
US11325223B2May 10, 2022
Carrier head with segmented substrate chuck
APPLIED MATERIALS INC4 citations73
US10076817B2Sep 18, 2018
Orbital polishing with small pad
APPLIED MATERIALS INC3 citations73
US9751189B2Sep 5, 2017
Compliant polishing pad and polishing module
APPLIED MATERIALS INC4 citations73
US9662762B2May 30, 2017
Modifying substrate thickness profiles
APPLIED MATERIALS INC4 citations73
US9352441B2May 31, 2016
Chemical mechanical polisher with hub arms mounted
APPLIED MATERIALS INC5 citations73
US12337439B2Jun 24, 2025
Multiple disk pad conditioner
APPLIED MATERIALS INC0 citations62
US12330262B2Jun 17, 2025
Dual membrane carrier head for chemical mechanical polishing
APPLIED MATERIALS INC0 citations62
US12251788B2Mar 18, 2025
Polishing head with local wafer pressure
APPLIED MATERIALS INC0 citations62
US12214469B2Feb 4, 2025
Polishing head retaining ring tilting moment control
APPLIED MATERIALS INC0 citations62
US12128524B2Oct 29, 2024
Membrane for carrier head with segmented substrate chuck
APPLIED MATERIALS INC0 citations62
US12042899B2Jul 23, 2024
Polishing head with membrane position control
APPLIED MATERIALS INC0 citations62
US11986923B2May 21, 2024
Polishing head with local wafer pressure
APPLIED MATERIALS INC0 citations62
US11945073B2Apr 2, 2024
Dual membrane carrier head for chemical mechanical polishing
APPLIED MATERIALS INC0 citations62
US11904429B2Feb 20, 2024
Substrate polishing apparatus with contact extension or adjustable stop
APPLIED MATERIALS INC0 citations62
US11724357B2Aug 15, 2023
Pivotable substrate retaining ring
APPLIED MATERIALS INC0 citations62
US11511390B2Nov 29, 2022
Pivotable substrate retaining ring
APPLIED MATERIALS INC1 citations62
US12400892B2Aug 26, 2025
High throughput polishing modules and modular polishing systems
APPLIED MATERIALS INC0 citations61
US12394651B2Aug 19, 2025
High throughput polishing modules and modular polishing systems
APPLIED MATERIALS INC0 citations61
US11717936B2Aug 8, 2023
Methods for a web-based CMP system
APPLIED MATERIALS INC0 citations59
US11389925B2Jul 19, 2022
Offset head-spindle for chemical mechanical polishing
APPLIED MATERIALS INC0 citations58
US11623320B2Apr 11, 2023
Polishing head with membrane position control
APPLIED MATERIALS INC0 citations53
US12515296B2Jan 6, 2026
Polishing carrier head with floating edge control
APPLIED MATERIALS INC0 citations52
US12365060B2Jul 22, 2025
Chemical mechanical polishing correction tool
APPLIED MATERIALS INC0 citations52
US12251787B2Mar 18, 2025
Modular chemical mechanical polisher with simultaneous polishing and pad treatment
APPLIED MATERIALS INC0 citations52
US11931857B2Mar 19, 2024
Deformable substrate chuck
APPLIED MATERIALS INC0 citations52
US11890717B2Feb 6, 2024
Polishing system with platen for substrate edge control
APPLIED MATERIALS INC0 citations52
US11745227B2Sep 5, 2023
Substrate cleaning devices and methods thereof
APPLIED MATERIALS INC0 citations52
US9987724B2Jun 5, 2018
Polishing system with pad carrier and conditioning station
APPLIED MATERIALS INC0 citations52
US11780049B2Oct 10, 2023
Polishing carrier head with multiple angular pressurizable zones
APPLIED MATERIALS INC0 citations51
US12194591B2Jan 14, 2025
Roller for location-specific wafer polishing
APPLIED MATERIALS INC0 citations48
US12076877B2Sep 3, 2024
Polishing platens and polishing platen manufacturing methods
APPLIED MATERIALS INC0 citations48
US11919120B2Mar 5, 2024
Polishing system with contactless platen edge control
APPLIED MATERIALS INC0 citations48
US10786885B2Sep 29, 2020
Thin plastic polishing article for CMP applications
APPLIED MATERIALS INC0 citations38