Inventor

NOYA GO

JP11 patents

⚠️ This page may combine multiple inventors who share the name “NOYA GO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NOYA GO

2 patents

US8101333B2Jan 24, 2012

Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method

NOYA GO13 citations78

US9152052B2Oct 6, 2015

Composition for forming tungsten oxide film and method for producing tungsten oxide film using same

NOYA GO2 citations57

MERCK PATENT GMBH

2 patents

US11161982B2Nov 2, 2021

Film forming composition and film forming method using the same

MERCK PATENT GMBH0 citations61

US11059995B2Jul 13, 2021

Film forming composition

MERCK PATENT GMBH0 citations59

AZ ELECTRONIC MAT LUXEMBOURG SARL

2 patents

US10451971B2Oct 22, 2019

Composition for forming underlayer and method for forming underlayer therewith

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations39

US10435555B2Oct 8, 2019

Void forming composition, semiconductor device provided with voids formed using composition, and method for manufacturing semiconductor device using composition

AZ ELECTRONIC MAT LUXEMBOURG SARL0 citations38

AZ ELECTRONIC MATERIALS USA

1 patent

US7998664B2Aug 16, 2011

Processing liquid for resist substrate and method of processing resist substrate using the same

AZ ELECTRONIC MATERIALS USA4 citations59

YAMAMOTO KAZUMA

1 patent

US9360756B2Jun 7, 2016

Composition for forming fine resist pattern and pattern formation method using same

YAMAMOTO KAZUMA2 citations55

TAKANO YUSUKE

1 patent

US8501394B2Aug 6, 2013

Superfine-patterned mask, method for production thereof, and method employing the same for forming superfine-pattern

TAKANO YUSUKE1 citations51

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L

1 patent

US9494867B2Nov 15, 2016

Rinsing liquid for lithography and pattern forming method using same

AZ ELECTRONIC MAT (LUXEMBOURG) S A R L0 citations32

AKIYAMA YASUSHI

1 patent

US8568955B2Oct 29, 2013

Composition for formation of top antireflective film, and pattern formation method using the composition

AKIYAMA YASUSHI0 citations28