Inventor

JODA TAKUYA

JP13 patents

⚠️ This page may combine multiple inventors who share the name “JODA TAKUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOKUSAI ELECTRIC CORP

8 patents

US12084760B2Sep 10, 2024

Method of processing substrate, recording medium, substrate processing apparatus, and method of manufacturing semiconductor device

KOKUSAI ELECTRIC CORP0 citations61

US11168396B2Nov 9, 2021

Method of manufacturing semiconductor device and recording medium

KOKUSAI ELECTRIC CORP0 citations61

US11035037B2Jun 15, 2021

Substrate processing apparatus and metal member

KOKUSAI ELECTRIC CORP0 citations61

US10985017B2Apr 20, 2021

Method of manufacturing semiconductor device and non-transitory computer-readable recording medium

KOKUSAI ELECTRIC CORP1 citations61

US12503767B2Dec 23, 2025

Non-transitory computer-readable recording medium, substrate processing apparatus and substrate processing method

KOKUSAI ELECTRIC CORP0 citations60

US12000045B2Jun 4, 2024

Method of manufacturing semiconductor device, non-transitory computer-readable recording medium, substrate processing apparatus and substrate processing method

KOKUSAI ELECTRIC CORP0 citations60

US12148614B2Nov 19, 2024

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

KOKUSAI ELECTRIC CORP0 citations58

US12421609B2Sep 23, 2025

Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

KOKUSAI ELECTRIC CORP0 citations50

HITACHI INT ELECTRIC INC

5 patents

USD741823SOct 27, 2015

Vaporizer for substrate processing apparatus

HITACHI INT ELECTRIC INC49 citations96

US9793112B2Oct 17, 2017

Method of manufacturing semiconductor device and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC2 citations71

US12087598B2Sep 10, 2024

Substrate processing apparatus

HITACHI INT ELECTRIC INC1 citations62

US9646862B2May 9, 2017

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC1 citations50

US9502239B2Nov 22, 2016

Substrate processing method, substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

HITACHI INT ELECTRIC INC1 citations43