Inventor
KIM KYOUNG-MI
KR25 patents
⚠️ This page may combine multiple inventors who share the name “KIM KYOUNG-MI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
17 patentsUS7419759B2Sep 2, 2008
Photoresist composition and method of forming a pattern using the same
SAMSUNG ELECTRONICS CO LTD13 citations82
US10437145B2Oct 8, 2019
Method of detaching a pellicle from a photomask
SAMSUNG ELECTRONICS CO LTD4 citations72
US9880462B2Jan 30, 2018
Pellicle and exposure mask including the same
SAMSUNG ELECTRONICS CO LTD3 citations72
US9437452B2Sep 6, 2016
Method of forming a fine pattern by using block copolymers
SAMSUNG ELECTRONICS CO LTD4 citations71
US8377626B2Feb 19, 2013
Methods of forming a pattern using negative-type photoresist compositions
SAMSUNG ELECTRONICS CO LTD2 citations63
US7736527B2Jun 15, 2010
Siloxane polymer compositions and methods of manufacturing a capacitor using the same
SAMSUNG ELECTRONICS CO LTD6 citations63
US7387988B2Jun 17, 2008
Thinner composition and method of removing photoresist using the same
SAMSUNG ELECTRONICS CO LTD4 citations62
US7985347B2Jul 26, 2011
Methods of forming a pattern and methods of manufacturing a capacitor using the same
SAMSUNG ELECTRONICS CO LTD2 citations61
US7776730B2Aug 17, 2010
Siloxane polymer composition, method of forming a pattern using the same, and method of manufacturing a semiconductor using the same
SAMSUNG ELECTRONICS CO LTD2 citations61
US7026497B2Apr 11, 2006
Adhesive compound and method for forming photoresist pattern using the same
SAMSUNG ELECTRONICS CO LTD3 citations61
US7053030B2May 30, 2006
Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the same
SAMSUNG ELECTRONICS CO LTD2 citations59
US7863231B2Jan 4, 2011
Thinner composition and method of removing photoresist using the same
SAMSUNG ELECTRONICS CO LTD1 citations51
US7670748B2Mar 2, 2010
Cyclic compound, photoresist composition and method of forming a photoresist pattern using the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US7442489B2Oct 28, 2008
Photoresist composition and method of forming a photoresist pattern using the same
SAMSUNG ELECTRONICS CO LTD0 citations51
US7282319B2Oct 16, 2007
Photoresist composition and method of forming a pattern using same
SAMSUNG ELECTRONICS CO LTD1 citations51
US7258963B2Aug 21, 2007
Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition
SAMSUNG ELECTRONICS CO LTD0 citations51
US7070910B2Jul 4, 2006
Silazane compound amd methods for using the same
SAMSUNG ELECTRONICS CO LTD1 citations51