Inventor

HONG SOO-JIN

KR30 patents

⚠️ This page may combine multiple inventors who share the name “HONG SOO-JIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HONG SOO-JIN

SAMSUNG ELECTRONICS CO LTD

Method of forming an insulating layer in a trench isolation type semiconductor device

Structure of trench isolation and a method of forming the same

Semiconductor device having trench isolation layer and a method of forming the same

Methods of forming trench isolation regions having stress-reducing nitride layers therein

Structure of trench isolation and a method of forming the same

Method of forming a semiconductor device

Method of forming a trench device isolation structure with upper liner pattern

Trench isolation method for semiconductor device

Image sensor

Methods of manufacturing trench isolation structures using selective plasma ion immersion implantation and deposition (PIIID)

Semiconductor device having trench isolation layer and a method of forming the same

Trench device isolation structure

Method of forming a trench isolation structure comprising annealing the oxidation barrier layer thereof in a furnace

Image sensor

Image sensor

Methods of fabricating combined field oxide/trench isolation regions

Method for forming trench type isolation film using annealing

Image sensor

Image device and fabricating method thereof

Methods of manufacturing semiconductor devices

Image sensors including photoelectric conversion devices, trench, supporter, and isolation layer

Method of forming shallow trench isolation regions in devices with NMOS and PMOS regions

Semiconductor device including carrier accumulation layers

Methods of manufacturing semiconductor devices

Semiconductor device

Precursor composition for deposition of silicon dioxide film and method for fabricating semiconductor device using the same

Methods of forming a fine pattern on a substrate and methods of forming a semiconductor device having a fine pattern

LEE DONG-KAK

Semiconductor device having impurity doped polycrystalline layer including impurity diffusion prevention layer and dynamic random memory device including the semiconductor device

JEONG SEONG-HOON

Method of forming insulating layer and method of manufacturing transistor using the same

LEE DEOK-HYUNG

Semiconductor devices having polysilicon gate layer patterns and methods of manufacturing the same