Inventor
MIHARA SATORU
JP17 patents
⚠️ This page may combine multiple inventors who share the name “MIHARA SATORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
14 patentsUS6287986B1Sep 11, 2001
Sputtering film forming method, sputtering film forming equipment, and semiconductor device manufacturing method
FUJITSU LTD84 citations97
US6509593B2Jan 21, 2003
Semiconductor device and method of manufacturing the same
FUJITSU LTD50 citations95
US5681780AOct 28, 1997
Manufacture of semiconductor device with ashing and etching
FUJITSU LTD57 citations95
US6674633B2Jan 6, 2004
Process for producing a strontium ruthenium oxide protective layer on a top electrode
FUJITSU LTD19 citations91
US5447598ASep 5, 1995
Process for forming resist mask pattern
FUJITSU LTD54 citations91
US4987284AJan 22, 1991
Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma
FUJITSU LTD52 citations91
US6020111AFeb 1, 2000
Method of manufacturing semiconductor device with patterned lamination of Si film and metal film
FUJITSU LTD15 citations73
US5560803AOct 1, 1996
Plasma ashing method with oxygen pretreatment
FUJITSU LTD18 citations73
US6913970B2Jul 5, 2005
Semiconductor device and method of manufacturing the same
FUJITSU LTD10 citations72
US6044850AApr 4, 2000
Semiconductor device manufacturing method including ashing process
FUJITSU LTD9 citations71
US6071828AJun 6, 2000
Semiconductor device manufacturing method including plasma etching step
FUJITSU LTD6 citations62
US5750208AMay 12, 1998
Method for plasma downstream processing
FUJITSU LTD4 citations62
US5562775AOct 8, 1996
Plasma downstream processing
FUJITSU LTD3 citations62
US5030316AJul 9, 1991
Trench etching process
FUJITSU LTD6 citations61