Inventor
YOSHIDOME GOICHI
US21 patents
⚠️ This page may combine multiple inventors who share the name “YOSHIDOME GOICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
18 patentsUSD941372SJan 18, 2022
Process shield for a substrate processing chamber
APPLIED MATERIALS INC19 citations94
USD941371SJan 18, 2022
Process shield for a substrate processing chamber
APPLIED MATERIALS INC17 citations94
USD934315SOct 26, 2021
Deposition ring for a substrate processing chamber
APPLIED MATERIALS INC35 citations94
US7674360B2Mar 9, 2010
Mechanism for varying the spacing between sputter magnetron and target
APPLIED MATERIALS INC12 citations82
US10347475B2Jul 9, 2019
Holding assembly for substrate processing chamber
APPLIED MATERIALS INC7 citations79
US9472443B2Oct 18, 2016
Selectively groundable cover ring for substrate process chambers
APPLIED MATERIALS INC4 citations73
US9534286B2Jan 3, 2017
PVD target for self-centering process shield
APPLIED MATERIALS INC4 citations72
US11658016B2May 23, 2023
Shield for a substrate processing chamber
APPLIED MATERIALS INC2 citations68
US11339466B2May 24, 2022
Heated shield for physical vapor deposition chamber
APPLIED MATERIALS INC0 citations62
US10563304B2Feb 18, 2020
Methods and apparatus for dynamically treating atomic layer deposition films in physical vapor deposition chambers
APPLIED MATERIALS INC1 citations62
US11569069B2Jan 31, 2023
3D printed chamber components configured for lower film stress and lower operating temperature
APPLIED MATERIALS INC0 citations61
US12136544B2Nov 5, 2024
Etch uniformity improvement for single turn internal coil PVD chamber
APPLIED MATERIALS INC0 citations56
US10777391B2Sep 15, 2020
3D printed chamber components configured for lower film stress and lower operating temperature
APPLIED MATERIALS INC0 citations50
US12027352B2Jul 2, 2024
Apparatus for generating magnetic fields on substrates during semiconductor processing
APPLIED MATERIALS INC0 citations49
US10697057B2Jun 30, 2020
Collimator for use in a physical vapor deposition chamber
APPLIED MATERIALS INC0 citations48
US12203163B2Jan 21, 2025
Methods for shaping magnetic fields during semiconductor processing
APPLIED MATERIALS INC0 citations47
US9831075B2Nov 28, 2017
Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes
APPLIED MATERIALS INC0 citations41
US9644262B2May 9, 2017
Self-centering process shield
APPLIED MATERIALS INC0 citations39