Inventor

SHINJO TETSUYA

JP42 patents

⚠️ This page may combine multiple inventors who share the name “SHINJO TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHINJO TETSUYA

NISSAN CHEMICAL CORP

Adhesive composition for peeling off by irradiation with light, layered product, and production method and peeling method for layered product

Cleaning agent composition and cleaning method

Adhesive agent composition, layered product and production method for layered product, and method for reducing thickness of semiconductor forming substrate

Adhesive containing polydimethyl siloxane

Cleaning agent composition comprising an alkylamide solvent and a fluorine-containing quaternary ammonium salt

Laminate peeling method, laminate, and laminate production method

Laminate peeling method, laminate, and laminate production method

Multilayer object and release agent composition

Cleaning agent composition and cleaning method

Semiconductor substrate cleaning method, processed semiconductor substrate manufacturing method, and composition for peeling

Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition

Polysiloxane-containing temporary adhesive comprising heat-resistant polymerization inhibitor

Temporary adhesive containing phenyl group-containing polysiloxane

Method for cleaning semiconductor substrate, method for producing processed semiconductor substrate, and stripping composition

Temporary adhesive containing epoxy-modified polysiloxane

Laminated body including novolac resin as peeling layer

NISSAN CHEMICAL IND LTD

Resist underlayer film forming composition containing phenylindole-containing novolac resin

Underlayer coating forming composition for lithography containing compound having protected carboxyl group

Resist underlayer film forming composition for lithography containing polyether structure-containing resin

Resist underlayer film forming composition that contains novolac resin having polynuclear phenol

Resist underlayer film-forming composition containing copolymer resin having heterocyclic ring

Resist underlayer film forming composition

Carbazole novolak resin

Method of manufacturing semiconductor device using organic underlayer film forming composition for solvent development lithography process

Resist underlayer film forming composition

Underlayer coating forming composition for lithography containing cyclodextrin compound

Resist underlayer film-forming composition containing substituted crosslinkable compound

Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

Resist underlayer film-forming composition comprising carbonyl-containing polyhydroxy aromatic ring novolac resin

Resist underlayer film-forming composition containing substituted crosslinkable compound

Method for forming resist underlayer film

SHINJO TETSUYA

Composition for forming a resist underlayer film including hydroxyl group-containing carbazole novolac resin

Resist underlayer film-forming composition which contains alicyclic skeleton-containing carbazole resin

Composition for forming resist underlayer film for lithography including resin containing alicyclic ring and aromatic ring

TAKEI SATOSHI

Resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating

Underlying coating forming composition for lithography containing compound having protected carboxyl group

Underlayer coating forming composition containing dextrin ester compound

HORIGUCHI YUSUKE

Resist underlayer film forming composition containing liquid additive

Method of producing semiconductor device using resist underlayer film by photo-crosslinking curing

SAKAGUCHI TAKAHIRO

Resist underlayer film forming composition for lithography, containing aromatic fused ring-containing resin

SAITO DAIGO

Carbazole novolak resin

SOMEYA YASUNOBU

Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structure