Inventor
MINE TOSHIYUKI
JP83 patents
⚠️ This page may combine multiple inventors who share the name “MINE TOSHIYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
23 patentsUS6576943B1Jun 10, 2003
Semiconductor device for reducing leak currents and controlling a threshold voltage and using a thin channel structure
HITACHI LTD96 citations98
US6876023B2Apr 5, 2005
Gain cell type non-volatile memory having charge accumulating region charged or discharged by channel current from a thin film channel path
HITACHI LTD63 citations96
US6521943B1Feb 18, 2003
Semiconductor device having thin electrode layer adjacent gate insulator and method of manufacture
HITACHI LTD37 citations96
US6211531B1Apr 3, 2001
Controllable conduction device
HITACHI LTD63 citations96
US6060723AMay 9, 2000
Controllable conduction device
HITACHI LTD69 citations96
US6040605AMar 21, 2000
Semiconductor memory device
HITACHI LTD85 citations96
US5091761AFeb 25, 1992
Semiconductor device having an arrangement of IGFETs and capacitors stacked thereover
HITACHI LTD70 citations96
US6461916B1Oct 8, 2002
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making the device
HITACHI LTD67 citations95
US6444554B1Sep 3, 2002
Method of making a non-volatile memory and semiconductor device
HITACHI LTD36 citations95
US6657248B1Dec 2, 2003
Semiconductor device having groove isolation structure and gate oxide films with different thickness
HITACHI LTD20 citations93
US6194759B1Feb 27, 2001
Semiconductor memory device
HITACHI LTD21 citations93
US6656804B2Dec 2, 2003
Semiconductor device and production method thereof
HITACHI LTD26 citations92
US6144062ANov 7, 2000
Semiconductor device having thin electrode layer adjacent gate insulator and method of manufacture
HITACHI LTD35 citations92
US5846869ADec 8, 1998
Method of manufacturing semiconductor integrated circuit device
HITACHI LTD36 citations92
US4907046AMar 6, 1990
Semiconductor device with multilayer silicon oxide silicon nitride dielectric
HITACHI LTD39 citations92
US7860258B2Dec 28, 2010
Electro-acoustic transducer device
HITACHI LTD13 citations84
US7582901B2Sep 1, 2009
Semiconductor device comprising metal insulator metal (MIM) capacitor
HITACHI LTD12 citations84
US7109072B2Sep 19, 2006
Semiconductor material, field effect transistor and manufacturing method thereof
HITACHI LTD19 citations84
US6417052B1Jul 9, 2002
Fabrication process for semiconductor device
HITACHI LTD14 citations83
US6337293B1Jan 8, 2002
Method of forming a quantum memory element having a film of amorphous silicon
HITACHI LTD4 citations74
US5960266ASep 28, 1999
Process for manufacturing a quantum memory element device
HITACHI LTD9 citations74
US10852209B2Dec 1, 2020
Water leak sensing system and method
HITACHI LTD3 citations73
US7132713B2Nov 7, 2006
Controllable conduction device with electrostatic barrier
HITACHI LTD7 citations73
RENESAS TECH CORP
16 patentsUS7772053B2Aug 10, 2010
Method for fabrication of semiconductor device
RENESAS TECH CORP48 citations94
US7115943B2Oct 3, 2006
Nonvolatile semiconductor memory device and manufacturing method thereof
RENESAS TECH CORP39 citations93
US6710383B2Mar 23, 2004
MISFET semiconductor device having a high dielectric constant insulating film with tapered end portions
RENESAS TECH CORP13 citations93
US7528036B2May 5, 2009
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP18 citations92
US7375399B2May 20, 2008
Semiconductor memory device
RENESAS TECH CORP22 citations92
US7122900B2Oct 17, 2006
Semiconductor device and method manufacturing the same
RENESAS TECH CORP18 citations92
US6833582B2Dec 21, 2004
Nonvolatile semiconductor memory device
RENESAS TECH CORP52 citations91
US7692234B2Apr 6, 2010
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP8 citations84
US7442989B2Oct 28, 2008
Nonvolatile semiconductor memory device and method of manufacturing thereof
RENESAS TECH CORP11 citations84
US7221056B2May 22, 2007
Semiconductor integrated circuit device and manufacturing method thereof
RENESAS TECH CORP11 citations84
US7199022B2Apr 3, 2007
Manufacturing method of semiconductor device
RENESAS TECH CORP18 citations84
US7304345B2Dec 4, 2007
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP4 citations74
US7179711B2Feb 20, 2007
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP3 citations74
US7141475B2Nov 28, 2006
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP5 citations74
US7042055B2May 9, 2006
Semiconductor device and manufacturing thereof
RENESAS TECH CORP7 citations74
US7195976B2Mar 27, 2007
Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
RENESAS TECH CORP6 citations73
SHIMA AKIO
3 patentsMINE TOSHIYUKI
3 patentsUS8125012B2Feb 28, 2012
Non-volatile memory device with a silicon nitride charge holding film having an excess of silicon
MINE TOSHIYUKI20 citations83
US9214516B2Dec 15, 2015
Field effect silicon carbide transistor
MINE TOSHIYUKI8 citations82
US9318558B2Apr 19, 2016
MOS field effect transistor
MINE TOSHIYUKI3 citations71
RENESAS ELECTRONICS CORP
2 patentsMACHIDA SHUNTARO
1 patentHISAMOTO DIGH
1 patentYANAGI ITARU
1 patentShowing the top 50 of 83 patents by PatentIndex Score.