Inventor
OKUDAIRA SADAYUKI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “OKUDAIRA SADAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
29 patentsUS4992136AFeb 12, 1991
Dry etching method
HITACHI LTD259 citations99
US4985114AJan 15, 1991
Dry etching by alternately etching and depositing
HITACHI LTD601 citations99
US4857137AAug 15, 1989
Process for surface treatment
HITACHI LTD520 citations99
US4579623AApr 1, 1986
Method and apparatus for surface treatment by plasma
HITACHI LTD654 citations99
US4481229ANov 6, 1984
Method for growing silicon-including film by employing plasma deposition
HITACHI LTD143 citations97
US4599135AJul 8, 1986
Thin film deposition
HITACHI LTD82 citations96
US4330384AMay 18, 1982
Process for plasma etching
HITACHI LTD52 citations96
US4462863AJul 31, 1984
Microwave plasma etching
HITACHI LTD59 citations95
US4609426ASep 2, 1986
Method and apparatus for monitoring etching
HITACHI LTD63 citations94
US4563240AJan 7, 1986
Method and apparatus for plasma process
HITACHI LTD117 citations93
US5874013AFeb 23, 1999
Semiconductor integrated circuit arrangement fabrication method
HITACHI LTD18 citations92
US5643473AJul 1, 1997
Dry etching method
HITACHI LTD21 citations92
US5580420ADec 3, 1996
Plasma generating method and apparatus and plasma processing method and apparatus
HITACHI LTD39 citations92
US5147500ASep 15, 1992
Dry etching method
HITACHI LTD32 citations92
US4986877AJan 22, 1991
Method of dry etching
HITACHI LTD37 citations92
US4943344AJul 24, 1990
Etching method
HITACHI LTD41 citations92
US4705595ANov 10, 1987
Method for microwave plasma processing
HITACHI LTD32 citations92
US4624214ANov 25, 1986
Dry-processing apparatus
HITACHI LTD30 citations92
US4559100ADec 17, 1985
Microwave plasma etching apparatus
HITACHI LTD43 citations92
US4433228AFeb 21, 1984
Microwave plasma source
HITACHI LTD43 citations92
US4298419ANov 3, 1981
Dry etching apparatus
HITACHI LTD39 citations92
US4101411AJul 18, 1978
Plasma etching apparatus
HITACHI LTD33 citations92
US4844767AJul 4, 1989
Method of and apparatus for etching
HITACHI LTD25 citations89
US4430138AFeb 7, 1984
Microwave plasma etching apparatus having fan-shaped discharge
HITACHI LTD21 citations82
US6309980B1Oct 30, 2001
Semiconductor integrated circuit arrangement fabrication method
HITACHI LTD4 citations74
US6074958AJun 13, 2000
Semiconductor integrated circuit arrangement fabrication method
HITACHI LTD9 citations74
US5962347AOct 5, 1999
Semiconductor integrated circuit arrangement fabrication method
HITACHI LTD8 citations74
US5705029AJan 6, 1998
Dry etching method
HITACHI LTD13 citations74
US4436581AMar 13, 1984
Uniform etching of silicon (doped and undoped) utilizing ions
HITACHI LTD11 citations72