Inventor
SUAREZ EDWIN C
US20 patents
⚠️ This page may combine multiple inventors who share the name “SUAREZ EDWIN C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
19 patentsUS9355922B2May 31, 2016
Systems and methods for internal surface conditioning in plasma processing equipment
APPLIED MATERIALS INC150 citations99
US9966240B2May 8, 2018
Systems and methods for internal surface conditioning assessment in plasma processing equipment
APPLIED MATERIALS INC101 citations98
US6830624B2Dec 14, 2004
Blocker plate by-pass for remote plasma clean
APPLIED MATERIALS INC328 citations98
USD1038049SAug 6, 2024
Cover ring for use in semiconductor processing chamber
APPLIED MATERIALS INC21 citations92
US11400560B2Aug 2, 2022
Retaining ring design
APPLIED MATERIALS INC6 citations74
USD1069863SApr 8, 2025
Deposition ring of a process kit for semiconductor substrate processing
APPLIED MATERIALS INC4 citations71
USD1059312SJan 28, 2025
Deposition ring of a process kit for semiconductor substrate processing
APPLIED MATERIALS INC4 citations71
US11996315B2May 28, 2024
Thin substrate handling via edge clamping
APPLIED MATERIALS INC2 citations71
US10589399B2Mar 17, 2020
Textured small pad for chemical mechanical polishing
APPLIED MATERIALS INC3 citations71
US12100579B2Sep 24, 2024
Deposition ring for thin substrate handling via edge clamping
APPLIED MATERIALS INC0 citations61
US12553133B2Feb 17, 2026
Substrate handling system, method, and apparatus
APPLIED MATERIALS INC0 citations59
USD1064005SFeb 25, 2025
Grounding ring of a process kit for semiconductor substrate processing
APPLIED MATERIALS INC0 citations59
US10796922B2Oct 6, 2020
Systems and methods for internal surface conditioning assessment in plasma processing equipment
APPLIED MATERIALS INC0 citations52
US10707061B2Jul 7, 2020
Systems and methods for internal surface conditioning in plasma processing equipment
APPLIED MATERIALS INC0 citations52
US10593523B2Mar 17, 2020
Systems and methods for internal surface conditioning in plasma processing equipment
APPLIED MATERIALS INC0 citations52
US10490418B2Nov 26, 2019
Systems and methods for internal surface conditioning assessment in plasma processing equipment
APPLIED MATERIALS INC0 citations52
US12340979B2Jun 24, 2025
Semiconductor processing chamber for improved precursor flow
APPLIED MATERIALS INC0 citations50
US10610994B2Apr 7, 2020
Polishing system with local area rate control and oscillation mode
APPLIED MATERIALS INC0 citations41
US10434623B2Oct 8, 2019
Local area polishing system and polishing pad assemblies for a polishing system
APPLIED MATERIALS INC0 citations41