Inventor

CHOI YOO-JEONG

KR14 patents

⚠️ This page may combine multiple inventors who share the name “CHOI YOO-JEONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG SDI CO LTD

5 patents

US10066057B2Sep 4, 2018

Organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD2 citations70

US9971243B2May 15, 2018

Polymer, organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD2 citations70

US10332751B2Jun 25, 2019

Monomer, organic layer composition, organic layer, and method of forming patterns

SAMSUNG SDI CO LTD0 citations39

US10018914B2Jul 10, 2018

Hardmask composition and method of forming patterns using the hardmask composition

SAMSUNG SDI CO LTD0 citations39

US9371444B2Jun 21, 2016

Hardmask composition and method of forming patterns using the hardmask composition

SAMSUNG SDI CO LTD0 citations39

CHEIL IND INC

3 patents

US9725389B2Aug 8, 2017

Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition

CHEIL IND INC2 citations71

US9556094B2Jan 31, 2017

Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition

CHEIL IND INC6 citations71

US9671688B2Jun 6, 2017

Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask composition

CHEIL IND INC0 citations39

CHOI YOO-JEONG

3 patents

US8952373B2Feb 10, 2015

Hardmask composition and method of forming patterns and semiconductor integrated circuit device including the patterns

CHOI YOO-JEONG6 citations69

US9665003B2May 30, 2017

Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns

CHOI YOO-JEONG3 citations68

US9359276B2Jun 7, 2016

Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition

CHOI YOO-JEONG1 citations49

SONG JEE-YUN

1 patent

US9018776B2Apr 28, 2015

Hardmask composition including aromatic ring-containing compound, method of forming patterns, and semiconductor integrated circuit device including the patterns

SONG JEE-YUN20 citations89

OH SEUNG-BAE

1 patent

US8741539B2Jun 3, 2014

Hardmask composition, method of forming a pattern using the same, and semiconductor integrated circuit device including the pattern

OH SEUNG-BAE7 citations78

SONG HYUN JI

1 patent

US10345706B2Jul 9, 2019

Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition

SONG HYUN JI0 citations31