Inventor

JUNG DONG HA

KR55 patents

⚠️ This page may combine multiple inventors who share the name “JUNG DONG HA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JUNG DONG HA

HYNIX SEMICONDUCTOR INC

Metal line of semiconductor device and method for forming the same

Multi-layered metal line of semiconductor device for preventing diffusion between metal lines and method for forming the same

Metal line of semiconductor device having a diffusion barrier with an amorphous TaBN layer and method for forming the same

Multi-layered metal line having an improved diffusion barrier of a semiconductor device and method for forming the same

Metal line of semiconductor device without production of high resistance compound due to metal diffusion and method for forming the same

Method for manufacturing semiconductor device preventing loss of junction region

Metal line of semiconductor device and method for forming the same

Multi-layered metal line of semiconductor device for preventing diffusion between metal lines and method for forming the same

Multi-layered metal line of semiconductor device having excellent diffusion barrier and method for forming the same

Metal wire for a semiconductor device formed with a metal layer without voids therein and a method for forming the same

Metal line having a multi-layered diffusion layer in a semiconductor device and method for forming the same

Metal line of semiconductor device having a multilayer molybdenum diffusion barrier and method for forming the same

Multi-layer metal wiring of semiconductor device preventing mutual metal diffusion between metal wirings and method for forming the same

Metal line of semiconductor device having a diffusion barrier and method for forming the same

Metal line of semiconductor device having a diffusion barrier including CRxBy and method for forming the same

Metal line of semiconductor device having a diffusion barrier including CRxBy and method for forming the same

Method for manufacturing semiconductor device capable of reducing parasitic bit line capacitance

AVALANCHE TECHNOLOGY INC

MTJ stack and bottom electrode patterning process with ion beam etching using a single mask

Fabrication method for high-density MRAM using thin hard mask

Method for forming MTJ memory element

Method of manufacturing magnetic tunnel junction memory element

High density resistive memory having a vertical dual channel transistor

Method for manufacturing magnetic memory cells

Method for manufacturing magnetic memory cells

Memory device with increased separation between memory elements

Semiconductor memory device having increased separation between memory elements

Magnetic tunnel junction with non-metallic layer adjacent to free layer

SAMSUNG ELECTRONICS CO LTD

Damping device and washing machine including the same

Drum washing machine

Washing machine

Washing machine

Balancer of washing machine

Washing machine with balancer and control method thereof

Washing machine

Balancer and washing machine having the same

Balancer and washing machine having the same

Balancer and washing machine having the same

JUNG DONG HA

MTJ MRAM with stud patterning

Metal line of semiconductor device having a diffusion barrier with an amorphous TaBN layer and method for forming the same

Method for fabricating magnetic tunnel junction

Metal wire for a semiconductor device formed with a metal layer without voids therein and a method for forming the same

SK HYNIX INC

Memory system and data processing system including the same

Memory system and data processing system including the same

Memory system

Semiconductor devices comparing error codes and semiconductor systems including the same

SATOH KIMIHIRO

Redeposition control in MRAM fabrication process

MRAM fabrication method with sidewall cleaning

OH JOON SEOK

Electrical conductor line having a multilayer diffusion barrier for use in a semiconductor device and method for forming the same

JUNG DONG-HA

Cover for an optical disc drive and optical disc drive having the same

KIM BAEK MANN

Metal line of semiconductor device without production of high resistance compound due to metal diffusion and method for forming the same