Inventor

HWANG IN SEAK

KR41 patents

⚠️ This page may combine multiple inventors who share the name “HWANG IN SEAK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HWANG IN SEAK

SAMSUNG ELECTRONICS CO LTD

Trench isolation regions having recess-inhibiting layers therein that protect against overetching

Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching

Shallow trench isolation type semiconductor device and method of forming the same

One-cylinder stack capacitor and method for fabricating the same

Method for drying a wafer and apparatus for performing the same

Method for cleaning damaged layers and polymer residue from semiconductor device

Cylindrical capacitors having a stepped sidewall and methods for fabricating the same

Method for forming self-aligned selective silicide layer using chemical mechanical polishing in merged DRAM logic

Methods for manufacturing semiconductor devices having chamfered metal silicide layers

One-cylinder stack capacitor and method for fabricating the same

Semiconductor device and method of manufacturing the same

Methods of fabricating semiconductor devices

Cleaning solutions for removing contaminants from the surfaces of semiconductor substrates and cleaning methods using the same

Wiring structure of a semiconductor device and method of forming the same

Cleaning solution and method of cleaning a semiconductor device using the same

Shallow trench isolation type semiconductor device and method of forming the same

Semiconductor device and method of manufacturing the same

Semiconductor devices having plug insulators

Method of forming a contact hole of a semiconductor device

Etching method for manufacturing semiconductor device

Methods of fabricating semiconductor devices including support patterns

Chemical supply system and chemical mixing apparatus

Method of forming storage nodes comprising a base in a contact hole and related structures

Method of forming a self-aligned contact pad for use in a semiconductor device

Method for forming a silicide film of a semiconductor device

Method of fabricating semiconductor device

Semiconductor devices utilizing spacer structures

Method for forming a capacitor for use in a semiconductor device

Method and apparatus for cleaning a semiconductor substrate

Apparatus and method for removing a photoresist structure from a substrate

Method for forming a planarized layer of a semiconductor device

Cleaning solution including aqueous ammonia solution, acetic acid and deionized water for integrated circuit devices and methods of cleaning integrated circuit devices using the same

Methods of manufacturing semiconductor devices

KIM YOUNG-KUK

Methods of manufacturing semiconductor devices having self-aligned contact pads

Semiconductor devices having self-aligned contact pads

LEE KWANG-WOOK

Semiconductor devices including gate structure and method of fabricating the same

Method of manufacturing semiconductor device

SON YOON-HO

Memory device

KIM IN-GI

Apparatus and method for removing a photoresist structure from a substrate

LEE KEUM-JOO

Methods of fabricating recessed channel metal oxide semiconductor (MOS) transistors

AHN JONG-SUN

Chemical-mechanical polishing apparatus for manufacturing semiconductor devices