Inventor
IKENAGA KAZUYUKI
JP26 patents
⚠️ This page may combine multiple inventors who share the name “IKENAGA KAZUYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
20 patentsUS12191121B2Jan 7, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP2 citations74
US6850012B2Feb 1, 2005
Plasma processing apparatus
HITACHI HIGH TECH CORP10 citations74
US11664233B2May 30, 2023
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP2 citations73
US11257661B2Feb 22, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations73
US12437978B2Oct 7, 2025
Cleaning method of film layer in the plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US12112925B2Oct 8, 2024
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11424108B2Aug 23, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11315792B2Apr 26, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations62
US11107694B2Aug 31, 2021
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP0 citations62
US8006340B2Aug 30, 2011
Cleaning apparatus
HITACHI HIGH TECH CORP2 citations62
USD1094319SSep 23, 2025
Upper chamber for a plasma processing device
HITACHI HIGH TECH CORP0 citations61
US12266508B2Apr 1, 2025
Plasma processing apparatus and method for venting a processing chamber to atmosphere
HITACHI HIGH TECH CORP0 citations61
US10886106B2Jan 5, 2021
Plasma processing apparatus and method for venting a processing chamber to atmosphere
HITACHI HIGH TECH CORP0 citations61
US12494348B2Dec 9, 2025
Plasma processing apparatus and member of plasma processing chamber
HITACHI HIGH TECH CORP0 citations52
US11987880B2May 21, 2024
Manufacturing method and inspection method of interior member of plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US10490412B2Nov 26, 2019
Method for releasing sample and plasma processing apparatus using same
HITACHI HIGH TECH CORP0 citations52
US10395935B2Aug 27, 2019
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US9941133B2Apr 10, 2018
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US9607874B2Mar 28, 2017
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations52
US8024831B2Sep 27, 2011
Cleaning method
HITACHI HIGH TECH CORP0 citations51
HITACHI LTD
5 patentsUS6716301B2Apr 6, 2004
Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probe
HITACHI LTD25 citations92
US7601241B2Oct 13, 2009
Plasma processing apparatus and plasma processing method
HITACHI LTD9 citations84
US6911157B2Jun 28, 2005
Plasma processing method and apparatus using dynamic sensing of a plasma environment
HITACHI LTD17 citations84
US6793768B2Sep 21, 2004
Plasma-assisted processing apparatus
HITACHI LTD5 citations62
US7771607B2Aug 10, 2010
Plasma processing apparatus and plasma processing method
HITACHI LTD1 citations52