USD1094319SActiveUtility

Upper chamber for a plasma processing device

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Assignee: HITACHI HIGH TECH CORPPriority: Feb 10, 2022Filed: Jul 22, 2022Granted: Sep 23, 2025
Est. expiryFeb 10, 2042(~15.6 yrs left)· nominal 20-yr term from priority
Inventors:Koji NagaiTadayoshi KawaguchiKazuyuki IkenagaKohei Sato
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PatentIndex Score
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Cited by
8
References
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Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an upper chamber for a plasma processing device as shown and described.

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