Inventor · disambiguated record
Tadayoshi Kawaguchi
Also filed as: KAWAGUCHI TADAYOSHI
8 granted patents·10 pending applications·12 citations·filing 2003–2022
78Inventor score
Top patents by PatentIndex Score
18 records- 0175US11094509B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 17, 2021·2 cites·3 claims
- 0272US9039865B2Plasma processing apparatusYOSHIOKA KEN·Filed 2010·Granted May 26, 2015·3 cites·7 claims
- 0365US6914207B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2003·Granted Jul 5, 2005·6 cites·7 claims
- 0462US10998168B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted May 4, 2021·0 cites·4 claims
- 0562US10796884B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Oct 6, 2020·1 cites·15 claims
- 0651US2025046582A1Regenerating method for inner member of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 0748US10541115B2Plasma processing apparatusSAKKA YUSAKU·Filed 2012·Granted Jan 21, 2020·0 cites·2 claims
- 0848US2024240300A1Restoring method for inner wall member of plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2021·Application pending·0 cites
- 0947US2008236494A1Plasma processing apparatusKAWAGUCHI TADAYOSHI·Filed 2007·Application pending·0 cites
- 1046US10229813B2Plasma processing apparatus with lattice-like faraday shieldsHITACHI HIGH TECH CORP·Filed 2014·Granted Mar 12, 2019·0 cites·5 claims
- 1144US2007215278A1Plasma etching apparatus and method for forming inner wall of plasma processing chamberFURUSE MUNEO·Filed 2006·Application pending·0 cites
- 1243US2008236744A1Plasma etching equipmentFURUSE MUNEO·Filed 2007·Application pending·0 cites
- 1341US2008180030A1Plasma processing apparatusTETSUKA TSUTOMU·Filed 2007·Application pending·0 cites
- 1440US2013299091A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1537US2013160949A1Plasma processing apparatusSAKKA YUSAKU·Filed 2012·Application pending·0 cites
- 1635US2012267050A1Plasma processing apparatusSAKKA YUSAKU·Filed 2011·Application pending·0 cites
- 1734US2012138229A1Plasma processing apparatusSAKKA YUSAKU·Filed 2011·Application pending·0 cites
- 1830USD1094319SUpper chamber for a plasma processing deviceHITACHI HIGH TECH CORP·Filed 2022·Granted Sep 23, 2025·0 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →