P

Inventor

OHNO HIROKI

JP43 patents
⚠️ This page may combine multiple inventors who share the name “OHNO HIROKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

23 patents
US7806989B2Oct 5, 2010

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD24 citations92
US6800546B2Oct 5, 2004

Film forming method by radiating a plasma on a surface of a low dielectric constant film

TOKYO ELECTRON LTD20 citations92
US6513537B1Feb 4, 2003

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD20 citations92
US5830280ANov 3, 1998

Washing liquid for post-polishing and polishing-cleaning method in semiconductor process

TOKYO ELECTRON LTD33 citations92
US6536452B1Mar 25, 2003

Processing apparatus and processing method

TOKYO ELECTRON LTD28 citations90
US7837804B2Nov 23, 2010

Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium

TOKYO ELECTRON LTD10 citations84
US10115609B2Oct 30, 2018

Separation and regeneration apparatus and substrate processing apparatus

TOKYO ELECTRON LTD6 citations73
US10046370B2Aug 14, 2018

Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium

TOKYO ELECTRON LTD3 citations73
US9662685B2May 30, 2017

Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium

TOKYO ELECTRON LTD5 citations73
US9583330B2Feb 28, 2017

Supercritical drying method for semiconductor substrate and supercritical drying apparatus

TOKYO ELECTRON LTD2 citations73
US10923368B2Feb 16, 2021

Substrate processing apparatus, substrate processing method, and storage medium

TOKYO ELECTRON LTD3 citations72
US9881784B2Jan 30, 2018

Substrate processing method, substrate processing apparatus, and storage medium

TOKYO ELECTRON LTD4 citations72
US10950465B2Mar 16, 2021

Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus

TOKYO ELECTRON LTD3 citations71
US10692739B2Jun 23, 2020

Substrate processing apparatus

TOKYO ELECTRON LTD2 citations71
US10504718B2Dec 10, 2019

Substrate processing apparatus, substrate processing method, and storage medium

TOKYO ELECTRON LTD5 citations71
US10395950B2Aug 27, 2019

Substrate processing apparatus, substrate processing method, and recording medium

TOKYO ELECTRON LTD5 citations71
US12198947B2Jan 14, 2025

Substrate cleaning method and substrate cleaning device

TOKYO ELECTRON LTD0 citations62
US10651061B2May 12, 2020

Substrate processing apparatus, substrate processing method and recording medium

TOKYO ELECTRON LTD1 citations62
US10207349B2Feb 19, 2019

High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container

TOKYO ELECTRON LTD1 citations62
US8794250B2Aug 5, 2014

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD3 citations62
US7803230B2Sep 28, 2010

Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method

TOKYO ELECTRON LTD5 citations62
US6895979B2May 24, 2005

Processing apparatus and processing method

TOKYO ELECTRON LTD2 citations60
US7767006B2Aug 3, 2010

Ozone processing apparatus and ozone processing method

TOKYO ELECTRON LTD1 citations51

UNIDEN KK

3 patents
US5801466ASep 1, 1998

Vibrator attaching structure

UNIDEN KK50 citations91
US5758289AMay 26, 1998

Telephone system and bell sound detecting method thereof

UNIDEN KK17 citations89
US5650790AJul 22, 1997

Antenna device for radio transmission-reception apparatus

UNIDEN KK11 citations68

KITZ CORP

2 patents
USD748226SJan 26, 2016

Rotary valve

KITZ CORP12 citations84
USD746411SDec 29, 2015

Valve element for rotary valve

KITZ CORP3 citations63

SEKIGUCHI KENJI

2 patents
US8147617B2Apr 3, 2012

Substrate cleaning method and computer readable storage medium

SEKIGUCHI KENJI8 citations82
US8137478B2Mar 20, 2012

Substrate processing method and substrate processing apparatus

SEKIGUCHI KENJI0 citations50

OHNO HIROKI

2 patents
US8056257B2Nov 15, 2011

Substrate processing apparatus and substrate processing method

OHNO HIROKI11 citations82
US8747689B2Jun 10, 2014

Liquid processing method, liquid processing apparatus and storage medium

OHNO HIROKI3 citations60

TOSHIBA KK

2 patents
US8372212B2Feb 12, 2013

Supercritical drying method and apparatus for semiconductor substrates

TOSHIBA KK5 citations72
US10096462B2Oct 9, 2018

Substrate processing method and storage medium

TOSHIBA KK1 citations52

ORII TAKEHIKO

1 patent
US8337659B2Dec 25, 2012

Substrate processing method and substrate processing apparatus

ORII TAKEHIKO10 citations82

TOPPAN FORMS CO LTD

1 patent
US8042742B2Oct 25, 2011

Noncontact IC label and method and apparatus for manufacturing the same

TOPPAN FORMS CO LTD10 citations80

JI LINAN

1 patent
US8771429B2Jul 8, 2014

Supercritical drying method for semiconductor substrate and supercritical drying apparatus

JI LINAN5 citations79

ADVANCED DISPLAY KK

1 patent
US6118511ASep 12, 2000

Manufacturing method of liquid crystal display panel and cleaning apparatus for use therein

ADVANCED DISPLAY KK11 citations73

UNIDEN AMERICA CORP

1 patent
US5732355AMar 24, 1998

Telephone system

UNIDEN AMERICA CORP15 citations70

HAYASHI HIDEKAZU

1 patent
US10199240B2Feb 5, 2019

Substrate processing method, substrate processing apparatus, and storage medium

HAYASHI HIDEKAZU1 citations62

WATANABE TSUKASA

1 patent
US8197606B2Jun 12, 2012

Substrate cleaning method, substrate cleaning apparatus, control program, and computer-readable storage medium

WATANABE TSUKASA2 citations62

NEC ELECTRONICS CORP

1 patent
US7064079B2Jun 20, 2006

Method of removing polymer and apparatus for doing the same

NEC ELECTRONICS CORP4 citations59

GOUSHI KAISHA TOUKURIKI SHOTEN

1 patent
US5049076ASep 17, 1991

Method of bonding metal to dentine

GOUSHI KAISHA TOUKURIKI SHOTEN1 citations46