Inventor
MARUMOTO HIROSHI
JP15 patents
Patents
15 patentsUS9953840B2Apr 24, 2018
Substrate processing method and substrate processing system
TOKYO ELECTRON LTD5 citations72
US10950465B2Mar 16, 2021
Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatus
TOKYO ELECTRON LTD3 citations71
US10692739B2Jun 23, 2020
Substrate processing apparatus
TOKYO ELECTRON LTD2 citations71
US10576493B2Mar 3, 2020
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD6 citations71
US10504718B2Dec 10, 2019
Substrate processing apparatus, substrate processing method, and storage medium
TOKYO ELECTRON LTD5 citations71
US10395950B2Aug 27, 2019
Substrate processing apparatus, substrate processing method, and recording medium
TOKYO ELECTRON LTD5 citations71
US9508574B2Nov 29, 2016
Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage medium
TOKYO ELECTRON LTD2 citations62
US12226796B2Feb 18, 2025
Bath systems and methods thereof
TOKYO ELECTRON LTD0 citations60
US11738363B2Aug 29, 2023
Bath systems and methods thereof
TOKYO ELECTRON LTD1 citations60
US9576829B1Feb 21, 2017
Process liquid supply apparatus operating method, process liquid supply apparatus and non-transitory storage medium
TOKYO ELECTRON LTD1 citations51
US11862483B2Jan 2, 2024
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD0 citations50
US12488452B2Dec 2, 2025
Wafer bath imaging
TOKYO ELECTRON LTD0 citations49
US10844332B2Nov 24, 2020
Aqueous cleaning solution and method of protecting features on a substrate during etch residue removal
TOKYO ELECTRON LTD0 citations49
US10847387B2Nov 24, 2020
Substrate processing apparatus, substrate processing method and recording medium
TOKYO ELECTRON LTD0 citations40
US10707098B2Jul 7, 2020
Substrate processing apparatus, substrate processing method and memory medium
TOKYO ELECTRON LTD0 citations40