Inventor
SON YONG HOON
KR106 patents
⚠️ This page may combine multiple inventors who share the name “SON YONG HOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
34 patentsUS7679133B2Mar 16, 2010
Vertical-type non-volatile memory devices
SAMSUNG ELECTRONICS CO LTD873 citations99
US7074662B2Jul 11, 2006
Methods for fabricating fin field effect transistors using a protective layer to reduce etching damage
SAMSUNG ELECTRONICS CO LTD176 citations99
US8053829B2Nov 8, 2011
Methods of fabricating nonvolatile memory devices
SAMSUNG ELECTRONICS CO LTD208 citations98
US7141856B2Nov 28, 2006
Multi-structured Si-fin
SAMSUNG ELECTRONICS CO LTD104 citations98
US7320908B2Jan 22, 2008
Methods of forming semiconductor devices having buried oxide patterns
SAMSUNG ELECTRONICS CO LTD34 citations93
US7176067B2Feb 13, 2007
Methods of fabricating fin field effect transistors
SAMSUNG ELECTRONICS CO LTD23 citations93
US7071048B2Jul 4, 2006
Methods of fabricating fin field effect transistors having capping insulation layers
SAMSUNG ELECTRONICS CO LTD40 citations93
US7534686B2May 19, 2009
Multi-structured Si-fin and method of manufacture
SAMSUNG ELECTRONICS CO LTD26 citations92
US7122871B2Oct 17, 2006
Integrated circuit field effect transistors including channel-containing fin having regions of high and low doping concentrations
SAMSUNG ELECTRONICS CO LTD35 citations92
US11335685B2May 17, 2022
Semiconductor memory device
SAMSUNG ELECTRONICS CO LTD7 citations86
US10418374B2Sep 17, 2019
Vertical memory devices
SAMSUNG ELECTRONICS CO LTD16 citations86
US9070581B2Jun 30, 2015
Vertical-type semiconductor devices and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations84
US8039350B2Oct 18, 2011
Methods of fabricating MOS transistors having recesses with elevated source/drain regions
SAMSUNG ELECTRONICS CO LTD9 citations84
US7998851B2Aug 16, 2011
Semiconductor devices having contact plugs with stress buffer spacers and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD11 citations84
US7683405B2Mar 23, 2010
MOS transistors having recesses with elevated source/drain regions
SAMSUNG ELECTRONICS CO LTD12 citations84
US7642589B2Jan 5, 2010
Fin field effect transistors having capping insulation layers
SAMSUNG ELECTRONICS CO LTD9 citations84
US7537980B2May 26, 2009
Method of manufacturing a stacked semiconductor device
SAMSUNG ELECTRONICS CO LTD14 citations84
US7521301B2Apr 21, 2009
Methods for fabricating integrated circuit field effect transistors including channel-containing fin having regions of high and low doping concentrations
SAMSUNG ELECTRONICS CO LTD10 citations84
US7394117B2Jul 1, 2008
Fin field effect transistors including epitaxial fins
SAMSUNG ELECTRONICS CO LTD9 citations84
US7205609B2Apr 17, 2007
Methods of forming semiconductor devices including fin structures and related devices
SAMSUNG ELECTRONICS CO LTD10 citations84
US10971516B2Apr 6, 2021
Three-dimensional semiconductor memory devices and methods of fabricating the same
SAMSUNG ELECTRONICS CO LTD9 citations83
US10553582B2Feb 4, 2020
Semiconductor device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD6 citations83
US9905568B2Feb 27, 2018
Nonvolatile memory device and a method for fabricating the same
SAMSUNG ELECTRONICS CO LTD7 citations83
US9893077B2Feb 13, 2018
Memory device and method of manufacturing the same
SAMSUNG ELECTRONICS CO LTD9 citations82
US7432173B2Oct 7, 2008
Methods of fabricating silicon-on-insulator substrates having a laser-formed single crystalline film
SAMSUNG ELECTRONICS CO LTD14 citations82
US10804289B2Oct 13, 2020
Three-dimensional semiconductor device
SAMSUNG ELECTRONICS CO LTD9 citations79
US9716181B2Jul 25, 2017
Semiconductor device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD7 citations79
US7960780B2Jun 14, 2011
Vertical-type semiconductor device
SAMSUNG ELECTRONICS CO LTD5 citations74
US11502086B2Nov 15, 2022
Semiconductor memory device and method for manufacturing the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US11417659B2Aug 16, 2022
Semiconductor memory device and method of fabricating the same
SAMSUNG ELECTRONICS CO LTD4 citations73
US11057183B2Jul 6, 2021
Nonvolatile semiconductor devices including non-circular shaped channel patterns and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations73
US10109642B2Oct 23, 2018
Vertical-type semiconductor devices and methods of manufacturing the same
SAMSUNG ELECTRONICS CO LTD2 citations73
US8980731B2Mar 17, 2015
Methods of forming a semiconductor device
SAMSUNG ELECTRONICS CO LTD6 citations72
US11462554B2Oct 4, 2022
Three-dimensional semiconductor memory device with concave convex separation structures
SAMSUNG ELECTRONICS CO LTD2 citations71
SON YONG-HOON
11 patentsUS8063438B2Nov 22, 2011
Vertical-type semiconductor devices
SON YONG-HOON30 citations96
US8492828B2Jul 23, 2013
Vertical-type non-volatile memory devices
SON YONG-HOON15 citations93
US8236650B2Aug 7, 2012
Vertical-type non-volatile memory devices and methods of manufacturing the same
SON YONG-HOON27 citations93
US8450176B2May 28, 2013
Methods of manufacturing rewriteable three-dimensional semiconductor memory devices
SON YONG-HOON24 citations92
US8482049B2Jul 9, 2013
Semiconductor devices and methods for fabricating the same
SON YONG-HOON23 citations89
US8923057B2Dec 30, 2014
Three-dimensional semiconductor memory device with active patterns and electrodes arranged above a substrate
SON YONG-HOON13 citations84
US8304318B2Nov 6, 2012
Methods of fabricating MOS transistors having recesses with elevated source/drain regions
SON YONG-HOON9 citations84
US9356033B2May 31, 2016
Three-dimensional semiconductor memory devices and methods of forming the same
SON YONG-HOON7 citations83
US8236673B2Aug 7, 2012
Methods of fabricating vertical semiconductor device utilizing phase changes in semiconductor materials
SON YONG-HOON14 citations83
US8063441B2Nov 22, 2011
Vertical type semiconductor device
SON YONG-HOON6 citations74
US8455316B2Jun 4, 2013
Method of manufacturing vertical semiconductor device
SON YONG-HOON6 citations73
SON YONG HOON
3 patentsUS9997538B2Jun 12, 2018
Semiconductor device including channel structure
SON YONG HOON10 citations84
US9929179B2Mar 27, 2018
Nonvolatile semiconductor devices including non-circular shaped channel patterns and methods of manufacturing the same
SON YONG HOON5 citations84
US9997534B2Jun 12, 2018
Vertical memory devices
SON YONG HOON14 citations82
KIM JUNG HO
1 patentKANG PIL-KYU
1 patentShowing the top 50 of 106 patents by PatentIndex Score.