P

Inventor

SON YONG HOON

KR106 patents
⚠️ This page may combine multiple inventors who share the name “SON YONG HOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

34 patents
US7679133B2Mar 16, 2010

Vertical-type non-volatile memory devices

SAMSUNG ELECTRONICS CO LTD873 citations99
US7074662B2Jul 11, 2006

Methods for fabricating fin field effect transistors using a protective layer to reduce etching damage

SAMSUNG ELECTRONICS CO LTD176 citations99
US8053829B2Nov 8, 2011

Methods of fabricating nonvolatile memory devices

SAMSUNG ELECTRONICS CO LTD208 citations98
US7141856B2Nov 28, 2006

Multi-structured Si-fin

SAMSUNG ELECTRONICS CO LTD104 citations98
US7320908B2Jan 22, 2008

Methods of forming semiconductor devices having buried oxide patterns

SAMSUNG ELECTRONICS CO LTD34 citations93
US7176067B2Feb 13, 2007

Methods of fabricating fin field effect transistors

SAMSUNG ELECTRONICS CO LTD23 citations93
US7071048B2Jul 4, 2006

Methods of fabricating fin field effect transistors having capping insulation layers

SAMSUNG ELECTRONICS CO LTD40 citations93
US7534686B2May 19, 2009

Multi-structured Si-fin and method of manufacture

SAMSUNG ELECTRONICS CO LTD26 citations92
US7122871B2Oct 17, 2006

Integrated circuit field effect transistors including channel-containing fin having regions of high and low doping concentrations

SAMSUNG ELECTRONICS CO LTD35 citations92
US11335685B2May 17, 2022

Semiconductor memory device

SAMSUNG ELECTRONICS CO LTD7 citations86
US10418374B2Sep 17, 2019

Vertical memory devices

SAMSUNG ELECTRONICS CO LTD16 citations86
US9070581B2Jun 30, 2015

Vertical-type semiconductor devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD6 citations84
US8039350B2Oct 18, 2011

Methods of fabricating MOS transistors having recesses with elevated source/drain regions

SAMSUNG ELECTRONICS CO LTD9 citations84
US7998851B2Aug 16, 2011

Semiconductor devices having contact plugs with stress buffer spacers and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD11 citations84
US7683405B2Mar 23, 2010

MOS transistors having recesses with elevated source/drain regions

SAMSUNG ELECTRONICS CO LTD12 citations84
US7642589B2Jan 5, 2010

Fin field effect transistors having capping insulation layers

SAMSUNG ELECTRONICS CO LTD9 citations84
US7537980B2May 26, 2009

Method of manufacturing a stacked semiconductor device

SAMSUNG ELECTRONICS CO LTD14 citations84
US7521301B2Apr 21, 2009

Methods for fabricating integrated circuit field effect transistors including channel-containing fin having regions of high and low doping concentrations

SAMSUNG ELECTRONICS CO LTD10 citations84
US7394117B2Jul 1, 2008

Fin field effect transistors including epitaxial fins

SAMSUNG ELECTRONICS CO LTD9 citations84
US7205609B2Apr 17, 2007

Methods of forming semiconductor devices including fin structures and related devices

SAMSUNG ELECTRONICS CO LTD10 citations84
US10971516B2Apr 6, 2021

Three-dimensional semiconductor memory devices and methods of fabricating the same

SAMSUNG ELECTRONICS CO LTD9 citations83
US10553582B2Feb 4, 2020

Semiconductor device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD6 citations83
US9905568B2Feb 27, 2018

Nonvolatile memory device and a method for fabricating the same

SAMSUNG ELECTRONICS CO LTD7 citations83
US9893077B2Feb 13, 2018

Memory device and method of manufacturing the same

SAMSUNG ELECTRONICS CO LTD9 citations82
US7432173B2Oct 7, 2008

Methods of fabricating silicon-on-insulator substrates having a laser-formed single crystalline film

SAMSUNG ELECTRONICS CO LTD14 citations82
US10804289B2Oct 13, 2020

Three-dimensional semiconductor device

SAMSUNG ELECTRONICS CO LTD9 citations79
US9716181B2Jul 25, 2017

Semiconductor device and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD7 citations79
US7960780B2Jun 14, 2011

Vertical-type semiconductor device

SAMSUNG ELECTRONICS CO LTD5 citations74
US11502086B2Nov 15, 2022

Semiconductor memory device and method for manufacturing the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US11417659B2Aug 16, 2022

Semiconductor memory device and method of fabricating the same

SAMSUNG ELECTRONICS CO LTD4 citations73
US11057183B2Jul 6, 2021

Nonvolatile semiconductor devices including non-circular shaped channel patterns and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US10109642B2Oct 23, 2018

Vertical-type semiconductor devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD2 citations73
US8980731B2Mar 17, 2015

Methods of forming a semiconductor device

SAMSUNG ELECTRONICS CO LTD6 citations72
US11462554B2Oct 4, 2022

Three-dimensional semiconductor memory device with concave convex separation structures

SAMSUNG ELECTRONICS CO LTD2 citations71

SON YONG-HOON

11 patents

SON YONG HOON

3 patents

KIM JUNG HO

1 patent

KANG PIL-KYU

1 patent

Showing the top 50 of 106 patents by PatentIndex Score.