Inventor · disambiguated record
Osamu Suenaga
Also filed as: SUENAGA OSAMU
11 granted patents·1 pending application·139 citations·filing 2000–2004
91Inventor score
Top patents by PatentIndex Score
12 records- 0184US6756565B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2001·Granted Jun 29, 2004·24 cites·6 claims
- 0283US6427462B1Semiconductor manufacturing facility, semiconductor manufacturing apparatus and semiconductor manufacturing methodTOKYO ELECTRON LTD·Filed 2000·Granted Aug 6, 2002·31 cites·17 claims
- 0374US6370897B1Semiconductor manufacturing facilityTOKYO ELECTRON LTD·Filed 2000·Granted Apr 16, 2002·17 cites·10 claims
- 0471US6547660B1Semiconductor manufacturing facility, semiconductor manufacturing apparatus and semiconductor manufacturing methodTOKYO ELECTRON LTD·Filed 2000·Granted Apr 15, 2003·14 cites·23 claims
- 0568US6949719B2Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulatorTOKYO ELECTRON LTD·Filed 2004·Granted Sep 27, 2005·10 cites·14 claims
- 0667US7212977B2Managing apparatus and managing method of a semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2001·Granted May 1, 2007·13 cites·32 claims
- 0760US6799539B2System and method for utilization of waste heat of semiconductor equipment and heat exchanger used for utilization of waste heat of semiconductor equipmentTOKYO ELECTRON LTD·Filed 2002·Granted Oct 5, 2004·7 cites·8 claims
- 0860US6569696B2Device and method for manufacturing semiconductorTOKYO ELECTRON LTD·Filed 2001·Granted May 27, 2003·8 cites·11 claims
- 0959US7160362B2Method and device for cleaning airTAISEI CORP·Filed 2002·Granted Jan 9, 2007·12 cites·17 claims
- 1045US6883283B2Semiconductor manufacturing facility and a semiconductor manufacturing methodTAISEI CORP·Filed 2002·Granted Apr 26, 2005·1 cites·6 claims
- 1145US6881685B2Device and method for feeding treating airTAISEI CORP·Filed 2002·Granted Apr 19, 2005·2 cites·7 claims
- 1232US2004069448A1Exhaust heat utilization system, exhaust heat utilization method, and semiconductor production facilityFiled 2002·Application pending·0 cites
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