Assignee
TOKYO ELECTRON LTD
JP·9,101 granted patents·3,944 pending applications·190,636 citations·filing 1984–2025
Top patents by PatentIndex Score
13,045 records- 0199US11640118B2Method of pattern alignment for field stitchingTOKYO ELECTRON LTD·Filed 2021·Granted May 2, 2023·4 cites·19 claims
- 0299US11527545B2Architecture design and process for 3D logic and 3D memoryTOKYO ELECTRON LTD·Filed 2020·Granted Dec 13, 2022·10 cites·20 claims
- 0399US10707054B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Jul 7, 2020·41 cites·19 claims
- 0499US10672616B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Jun 2, 2020·40 cites·7 claims
- 0599US10522343B2Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatmentTOKYO ELECTRON LTD·Filed 2015·Granted Dec 31, 2019·40 cites·20 claims
- 0699US9922824B2Method of forming silicon filmTOKYO ELECTRON LTD·Filed 2015·Granted Mar 20, 2018·338 cites·18 claims
- 0799USD803802SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 28, 2017·285 cites·1 claims
- 0899USD802472SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Nov 14, 2017·280 cites·1 claims
- 0999US9803926B2Support mechanism and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Oct 31, 2017·280 cites·6 claims
- 1099USD795208SElectrostatic chuck for semiconductor manufacturing equipmentTOKYO ELECTRON LTD·Filed 2016·Granted Aug 22, 2017·445 cites·1 claims
- 1199US9613801B2Integration of absorption based heating bake methods into a photolithography track systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 4, 2017·464 cites·18 claims
- 1299US8343306B2Plasma processing apparatus and method of plasma distribution correctionTOKYO ELECTRON LTD·Filed 2008·Granted Jan 1, 2013·81 cites·5 claims
- 1399US8041197B2Heating apparatus, heat treatment apparatus, computer program and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Oct 18, 2011·562 cites·21 claims
- 1499US8020315B2Substrate processing method, substrate processing apparatus, and program storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Sep 20, 2011·521 cites·6 claims
- 1599US7994070B1Low-temperature dielectric film formation by chemical vapor depositionTOKYO ELECTRON LTD·Filed 2010·Granted Aug 9, 2011·416 cites·18 claims
- 1699US7897217B2Method and system for performing plasma enhanced atomic layer depositionTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·442 cites·22 claims
- 1799US7816278B2In-situ hybrid deposition of high dielectric constant films using atomic layer deposition and chemical vapor depositionTOKYO ELECTRON LTD·Filed 2008·Granted Oct 19, 2010·523 cites·19 claims
- 1899US7767262B2Nitrogen profile engineering in nitrided high dielectric constant filmsTOKYO ELECTRON LTD·Filed 2006·Granted Aug 3, 2010·519 cites·22 claims
- 1999US7723648B2Temperature controlled substrate holder with non-uniform insulation layer for a substrate processing systemTOKYO ELECTRON LTD·Filed 2006·Granted May 25, 2010·551 cites·16 claims
- 2099USD616390SQuartz cover for manufacturing semiconductor wafersTOKYO ELECTRON LTD·Filed 2009·Granted May 25, 2010·419 cites·1 claims
- 2199USD616394SSupport of wafer boat for manufacturing semiconductor wafersTOKYO ELECTRON LTD·Filed 2009·Granted May 25, 2010·446 cites·1 claims
- 2299US7651961B2Method for forming strained silicon nitride films and a device containing such filmsTOKYO ELECTRON LTD·Filed 2007·Granted Jan 26, 2010·528 cites·27 claims
- 2399US7645484B2Method of forming a metal carbide or metal carbonitride film having improved adhesionTOKYO ELECTRON LTD·Filed 2006·Granted Jan 12, 2010·527 cites·25 claims
- 2499US7591601B2Coater/developer, coating/developing method, and storage mediumTOKYO ELECTRON LTD·Filed 2008·Granted Sep 22, 2009·464 cites·20 claims
- 2599USD583395SCover for a heater stage of a plasma processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Dec 23, 2008·425 cites·1 claims
- 2699US7422636B2Plasma enhanced atomic layer deposition system having reduced contaminationTOKYO ELECTRON LTD·Filed 2005·Granted Sep 9, 2008·466 cites·21 claims
- 2799US7243610B2Plasma device and plasma generating methodTOKYO ELECTRON LTD·Filed 2002·Granted Jul 17, 2007·226 cites·20 claims
- 2899US6872259B2Method of and apparatus for tunable gas injection in a plasma processing systemTOKYO ELECTRON LTD·Filed 2002·Granted Mar 29, 2005·624 cites·49 claims
- 2999US6740853B1Multi-zone resistance heaterTOKYO ELECTRON LTD·Filed 2000·Granted May 25, 2004·782 cites·43 claims
- 3099US6699003B2Carrying deviceTOKYO ELECTRON LTD·Filed 2002·Granted Mar 2, 2004·522 cites·7 claims
- 3199US6506253B2Photo-excited gas processing apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2001·Granted Jan 14, 2003·538 cites·20 claims
- 3299US6494998B1Process apparatus and method for improving plasma distribution and performance in an inductively coupled plasma using an internal inductive elementTOKYO ELECTRON LTD·Filed 2000·Granted Dec 17, 2002·504 cites·19 claims
- 3399US6450757B1Conveyor systemTOKYO ELECTRON LTD·Filed 1999·Granted Sep 17, 2002·549 cites·6 claims
- 3499US6433298B1Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Aug 13, 2002·428 cites·6 claims
- 3599US6247245B1Processing unit for substrate manufactureTOKYO ELECTRON LTD·Filed 1999·Granted Jun 19, 2001·461 cites·9 claims
- 3699US5718574AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Feb 17, 1998·581 cites·23 claims
- 3798US11764092B2Substrate transfer apparatus and substrate processing systemTOKYO ELECTRON LTD·Filed 2020·Granted Sep 19, 2023·6 cites·4 claims
- 3898US11501995B2Plasma processing apparatus and mounting table thereofTOKYO ELECTRON LTD·Filed 2020·Granted Nov 15, 2022·7 cites·17 claims
- 3998US11476089B2Control method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Oct 18, 2022·7 cites·27 claims
- 4098US11302587B2Method for fabricating a 3D semiconductor apparatus having two vertically disposed seminconductor devicesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 12, 2022·5 cites·20 claims
- 4198US10998169B2Systems and methods of control for plasma processingTOKYO ELECTRON LTD·Filed 2018·Granted May 4, 2021·44 cites·20 claims
- 4298US10991554B2Plasma processing system with synchronized signal modulationTOKYO ELECTRON LTD·Filed 2018·Granted Apr 27, 2021·49 cites·20 claims
- 4398US10991626B2Method for controlling transistor delay of nanowire or nanosheet transistor devicesTOKYO ELECTRON LTD·Filed 2020·Granted Apr 27, 2021·6 cites·13 claims
- 4498US10978274B2Plasma processing apparatus and method for generating plasmaTOKYO ELECTRON LTD·Filed 2019·Granted Apr 13, 2021·42 cites·10 claims
- 4598US10847363B2Method of selective deposition for forming fully self-aligned viasTOKYO ELECTRON LTD·Filed 2018·Granted Nov 24, 2020·39 cites·20 claims
- 4698US10763139B2Vacuum transfer module and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Sep 1, 2020·338 cites·15 claims
- 4798US10734224B2Method and device for incorporating single diffusion break into nanochannel structures of FET devicesTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·20 cites·15 claims
- 4898US10672596B2Ionized physical vapor deposition (IPVD) apparatus and method for an inductively coupled plasma sweeping sourceTOKYO ELECTRON LTD·Filed 2017·Granted Jun 2, 2020·40 cites·28 claims
- 4998US10665434B2Slip ring, support mechanism, and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted May 26, 2020·43 cites·15 claims
- 5098US10622196B2Plasma processing apparatusTOKYO ELECTRON LTD·Filed 2014·Granted Apr 14, 2020·341 cites·13 claims
Showing the top 50 of 13,045 patent records by PatentIndex Score.
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