Inventor
KAKUMU MASAKAZU
JP36 patents
⚠️ This page may combine multiple inventors who share the name “KAKUMU MASAKAZU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNISANTIS ELECT SINGAPORE PTE
22 patentsUS12125520B2Oct 22, 2024
Semiconductor memory device
UNISANTIS ELECT SINGAPORE PTE2 citations73
US12369300B2Jul 22, 2025
Semiconductor memory device
UNISANTIS ELECT SINGAPORE PTE1 citations64
US12363883B2Jul 15, 2025
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE1 citations64
US12315544B2May 27, 2025
Semiconductor-element-including memory device
UNISANTIS ELECT SINGAPORE PTE1 citations64
US11980022B2May 7, 2024
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE1 citations62
US11798616B2Oct 24, 2023
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE1 citations62
US12588186B2Mar 24, 2026
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12477716B2Nov 18, 2025
Memory device with stacked body orthogonal to substrate and method using write and ease page refresh operations
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12437805B2Oct 7, 2025
Semiconductor device including memory element
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12419032B2Sep 16, 2025
Memory device including semiconductor element
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12419031B2Sep 16, 2025
Semiconductor-element-including memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12396154B2Aug 19, 2025
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12369301B2Jul 22, 2025
Memory device with semiconductor elements
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12362006B2Jul 15, 2025
Semiconductor-element-including memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12362005B2Jul 15, 2025
Semiconductor memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12317478B2May 27, 2025
Semiconductor memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12302548B2May 13, 2025
Memory device using semiconductor element
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12283306B2Apr 22, 2025
Memory device including semiconductor
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12283310B2Apr 22, 2025
Memory device with single-transistor DRAM cells with no capacitors, and memory cells stacked in the vertical direction using gate-all-around (GAA) technology
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12279411B2Apr 15, 2025
Memory device using semiconductor device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12245417B2Mar 4, 2025
Semiconductor-element-including memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
US12183391B2Dec 31, 2024
Semiconductor memory device and manufacturing method of semiconductor memory device
UNISANTIS ELECT SINGAPORE PTE0 citations52
TOSHIBA KK
13 patentsUS5756365AMay 26, 1998
Method of manufacturing MOS-type semiconductor device having electrode structure capable of coping with short-channel effects
TOSHIBA KK114 citations98
US4800176AJan 24, 1989
Method for forming contact portion in semiconductor integrated circuit devices
TOSHIBA KK97 citations94
US5654241AAug 5, 1997
Method for manufacturing a semiconductor device having reduced resistance of diffusion layers and gate electrodes
TOSHIBA KK19 citations92
US5466958ANov 14, 1995
MOS-type semiconductor device having electrode structure capable of coping with short-channel effect and manufacturing method thereof
TOSHIBA KK42 citations92
US5592010AJan 7, 1997
Semiconductor device
TOSHIBA KK8 citations74
US5300462AApr 5, 1994
Method for forming a sputtered metal film
TOSHIBA KK19 citations74
US5278430AJan 11, 1994
Complementary semiconductor device using diamond thin film and the method of manufacturing this device
TOSHIBA KK14 citations74
US5073813ADec 17, 1991
Semiconductor device having buried element isolation region
TOSHIBA KK11 citations74
US4812889AMar 14, 1989
Semiconductor device FET with reduced energy level degeneration
TOSHIBA KK12 citations74
US5489795AFeb 6, 1996
Semiconductor integrated circuit device having double well structure
TOSHIBA KK16 citations73
US4746625AMay 24, 1988
A method of manufacturing semiconductor elements-isolating silicon oxide layers
TOSHIBA KK17 citations71
US4721687AJan 26, 1988
Method of increasing the thickness of a field oxide
TOSHIBA KK10 citations71
US5847412ADec 8, 1998
Semiconductor device and a method for manufacturing the same
TOSHIBA KK5 citations62