Inventor · disambiguated record
Marco Wedowski
Also filed as: WEDOWSKI MARCO · WEDOWSKI MARCO E
9 granted patents·4 pending applications·86 citations·filing 2002–2011
87Inventor score
Top patents by PatentIndex Score
13 records- 0181US7623620B2Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nmZEISS CARL SMT AG·Filed 2004·Granted Nov 24, 2009·26 cites·25 claims
- 0278US7172788B2Optical element and method for its manufacture as well as lithography apparatus and method for manufacturing a semiconductor deviceZEISS CARL SMT AG·Filed 2002·Granted Feb 6, 2007·19 cites·24 claims
- 0376US7060993B2Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elementsZEISS CARL SMT AG·Filed 2003·Granted Jun 13, 2006·15 cites·21 claims
- 0474US7154666B2Narrow-band spectral filter and the use thereofZEISS CARL SMT AG·Filed 2002·Granted Dec 26, 2006·18 cites·59 claims
- 0573US7462842B2Device, EUV lithographic device and method for preventing and cleaning contamination on optical elementsZEISS CARL SMT AG·Filed 2006·Granted Dec 9, 2008·3 cites·5 claims
- 0670US8164077B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementWEDOWSKI MARCO·Filed 2009·Granted Apr 24, 2012·3 cites·33 claims
- 0767US7646004B2Optical element for radiation in the EUV and/or soft X-ray region and an optical system with at least one optical elementZEISS CARL SMT AG·Filed 2006·Granted Jan 12, 2010·2 cites·50 claims
- 0850US8003960B2Reflective optical element, optical system and EUV lithography deviceZEISS CARL SMT GMBH·Filed 2009·Granted Aug 23, 2011·0 cites·28 claims
- 0947US8633460B2Reflective optical element, optical system EUV and lithography deviceWEDOWSKI MARCO·Filed 2011·Granted Jan 21, 2014·0 cites·17 claims
- 1042US2007143032A1Apparatus and method for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional bodyZEISS CARL SMT AG·Filed 2006·Application pending·0 cites
- 1141US2006076516A1Reflective optical element, optical system and EUV lithography deviceWEDOWSKI MARCO·Filed 2005·Application pending·0 cites
- 1233US2007285643A1Method For Manufacturing Reflective Optical Element, Reflective Optical Elements, Euv-Lithography Apparatus And Methods For Operating Optical Elements And Euv-Lithography Apparatus, Methods For Determining The Phase Shift, Methods For Determining The Layer Thickness, And Apparatuses For Carrying Out The MethodsZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1329US2007054497A1Method for preventing contamination and lithographic deviceWEISS MARKUS·Filed 2004·Application pending·0 cites
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