Inventor
NAGURA SHIGEHIRO
JP62 patents
⚠️ This page may combine multiple inventors who share the name “NAGURA SHIGEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
49 patentsUS5942367AAug 24, 1999
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO91 citations99
US5972560AOct 26, 1999
High molecular weight silicone compound, chemically amplified positive resist composition and patterning method
SHINETSU CHEMICAL CO94 citations98
US6440634B1Aug 27, 2002
Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process
SHINETSU CHEMICAL CO76 citations96
US6309796B1Oct 30, 2001
High molecular weight silicone compounds resist compositions, and patterning method
SHINETSU CHEMICAL CO63 citations96
US6048661AApr 11, 2000
Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation
SHINETSU CHEMICAL CO80 citations96
US5882844AMar 16, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO60 citations96
US5876900AMar 2, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO68 citations96
US4923119AMay 8, 1990
Sustained-release pheromone dispenser
SHINETSU CHEMICAL CO57 citations96
US5880169AMar 9, 1999
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO59 citations95
US6730453B2May 4, 2004
High molecular weight silicone compounds, resist compositions, and patterning method
SHINETSU CHEMICAL CO42 citations93
US6703183B2Mar 9, 2004
Polymer, resist composition and patterning process
SHINETSU CHEMICAL CO23 citations93
US6605408B2Aug 12, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO29 citations93
US6416928B1Jul 9, 2002
Onium salts, photoacid generators, resist compositions, and patterning process
SHINETSU CHEMICAL CO41 citations93
US6338931B1Jan 15, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO35 citations93
US6312869B1Nov 6, 2001
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO20 citations93
US6274286B1Aug 14, 2001
Resist compositions
SHINETSU CHEMICAL CO46 citations93
US6114462ASep 5, 2000
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO28 citations93
US6106993AAug 22, 2000
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO44 citations93
US6027854AFeb 22, 2000
Polymers chemically amplified positive resist compositions, and patterning method
SHINETSU CHEMICAL CO21 citations93
US5972559AOct 26, 1999
Chemically amplified positive resist compositions
SHINETSU CHEMICAL CO20 citations93
US4689267AAug 25, 1987
Composite hollow fiber
SHINETSU CHEMICAL CO41 citations93
US6395446B1May 28, 2002
Resist compositions and patterning process
SHINETSU CHEMICAL CO24 citations92
US6156477ADec 5, 2000
Polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO33 citations92
US6033828AMar 7, 2000
Partially hydrogenated polymers and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO23 citations92
US5972695AOct 26, 1999
Apparatus and method for the production of xanthan gum
SHINETSU CHEMICAL CO23 citations92
US5849461ADec 15, 1998
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO29 citations92
US5847218ADec 8, 1998
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO39 citations92
US5750309AMay 12, 1998
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO39 citations92
US5583244ADec 10, 1996
Siloxane-containing pullulan and method for the preparation thereof
SHINETSU CHEMICAL CO19 citations92
US5416206AMay 16, 1995
Modified xanthan gum and method for modifying xanthan gum
SHINETSU CHEMICAL CO23 citations92
US5994107ANov 30, 1999
Process of purifying xanthan gum using an alkaline protease and lysozyme
SHINETSU CHEMICAL CO17 citations91
US4761436AAug 2, 1988
Contact lens comprising triorganovinylsilane polymers
SHINETSU CHEMICAL CO33 citations91
US5824824AOct 20, 1998
Sulfonium salts and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO31 citations90
US7157207B2Jan 2, 2007
Polymer, resist material and patterning processing
SHINETSU CHEMICAL CO12 citations84
US5709801AJan 20, 1998
Removal of liquid from pullulan
SHINETSU CHEMICAL CO17 citations84
US5679556AOct 21, 1997
Process for the recovery and purification of xanthan gum
SHINETSU CHEMICAL CO19 citations83
US4734281AMar 29, 1988
Method for concurrently emitting vapors of sex pheromones of different insects
SHINETSU CHEMICAL CO23 citations82
US6641975B2Nov 4, 2003
Resist composition and patterning process
SHINETSU CHEMICAL CO12 citations74
US6335141B1Jan 1, 2002
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO13 citations74
US6194564B1Feb 27, 2001
Process for production of saline-solution soluble xanthan gum
SHINETSU CHEMICAL CO7 citations74
US6117621ASep 12, 2000
Patterning method
SHINETSU CHEMICAL CO14 citations74
US6030746AFeb 29, 2000
Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions
SHINETSU CHEMICAL CO13 citations74
US5985512ANov 16, 1999
Chemically amplified positive resist compositions
SHINETSU CHEMICAL CO15 citations74
US5864034AJan 26, 1999
Process for production of saline-solution soluble xanthan gum
SHINETSU CHEMICAL CO6 citations74
US5814694ASep 29, 1998
Anti-reflective coating composition
SHINETSU CHEMICAL CO8 citations74
US5493015AFeb 20, 1996
Method for reducing contaminative live bacteria in xanthan gum
SHINETSU CHEMICAL CO11 citations74
US4728431AMar 1, 1988
Pervaporation method for separating liquids in mixture
SHINETSU CHEMICAL CO11 citations74
US4649185AMar 10, 1987
Contact lens comprising trimethylvinylsilane polymer
SHINETSU CHEMICAL CO13 citations74
US4567245AJan 28, 1986
Substituted polyacetylene copolymer
SHINETSU CHEMICAL CO11 citations74
SHI ETSU CHEMICAL CO LTD
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