Inventor · disambiguated record
Hiroki Iriuda
Also filed as: IRIUDA HIROKI
6 granted patents·7 pending applications·4 citations·filing 2012–2024
68Inventor score
Top patents by PatentIndex Score
13 records- 0180US9574284B2Depression filling method and processing apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Feb 21, 2017·4 cites·3 claims
- 0279US2025066916A1Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0371US12173405B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Dec 24, 2024·0 cites·14 claims
- 0455US11282721B2Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Mar 22, 2022·0 cites·7 claims
- 0552US2014308820A1Method of depositing silicon oxide film and silicon nitride film and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 0649US11885024B2Gas introduction structure and processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted Jan 30, 2024·0 cites·13 claims
- 0748US11859285B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Jan 2, 2024·0 cites·19 claims
- 0846US2012252224A1Method of depositing silicon oxide film and silicon nitride film, film forming apparatus, and method of manufacturing semiconductor deviceENDO ATSUSHI·Filed 2012·Application pending·0 cites
- 0946US2017114464A1Vertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
- 1045US2022081768A1Processing apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1144US9425040B2Method of forming laminated film and forming apparatus thereofTOKYO ELECTRON LTD·Filed 2013·Granted Aug 23, 2016·0 cites·11 claims
- 1240US2014251209A1Support member and semiconductor manufacturing apparatusTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1337US2012247391A1Vertical batch-type film forming apparatusENDO ATSUSHI·Filed 2012·Application pending·0 cites
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