Inventor

MOREAU WAYNE M

US52 patents

⚠️ This page may combine multiple inventors who share the name “MOREAU WAYNE M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MOREAU WAYNE M

IBM

Antireflective silicon-containing compositions as hardmask layer

Antireflective silicon-containing compositions as hardmask layer

Mask-making using resist having SIO bond-containing polymer

Multifunctional polymeric materials and use thereof

Apparatus and method for increasing throughput in fluid processing

Resist composition and process of forming a patterned resist layer on a substrate

Top antireflective coating film

E-beam application to mask making using new improved KRS resist system

E-beam application to mask making using new improved KRS resist system

Antireflective coating films

High sensitivity positive resist layers and mask formation process

Mid and deep-UV antireflection coatings and methods for use thereof

Mid and deep-UV antireflection coatings and methods for use thereof

Developer/rinse formulation to prevent image collapse in resist

Antireflective coating for microlithography

Positive photoresist system for near-UV to visible imaging

Topcoat process to prevent image collapse

Radiation sensitive silicon-containing negative resists and use thereof

Process of drying a cast polymeric film disposed on a workpiece

Photoresist composition including polyalkylmethacrylate co-polymer of polyhydroxystyrene

Speed enhancers for acid sensitized resists

Diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers

Top coat for acid catalyzed resists

Highly sensitive dry developable deep UV photoresist

Turbine part mount for supercritical fluid processor

Polymer-bound sensitizer

Solid CO2 cleaning

Photo acid generator compounds, photo resists, and method for improving bias

Preparation of resist image with methacrylate polymers

Method to build a microfilter

Method of in situ monitoring of supercritical fluid process conditions

Radiation sensitive silicon-containing negative resists and use thereof

Fast diazoquinone positive resists comprising mixed esters of 4-sulfonate and 5-sulfonate compounds

Process for forming resist masks utilizing O-quinone diazide and pyrene

Thermally stable positive polycarbonate electron beam resists

Electron beam positive resists containing acetate polymers

Positive polymeric electron beam resists of very great sensitivity

Resists with enhanced sensitivity and contrast

Process of making diazoquinone sensitized polyamic acid based photoresist compositions having reduced dissolution rates in alkaline developers

Apparatus for photo exposure of materials with subsequent capturing of volatiles for analysis

Method for the rapid thermal control of a work piece in liquid or supercritical fluid

Sample holding chuck for use in reactor and reactor using same

Polymer-bound sensitizer

Etch improved resist systems containing acrylate (or methacrylate) silane monomers

Use of nitrocellulose containing 10.5 to 12% nitrogen as electron beam positive resists

SIMONS JOHN P

Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid

Apparatus and method for the rapid thermal control of a work piece in liquid or supercritical fluid

SHIPLEY CO LLC

Photoresist comprising blends of photoacid generators

LNTERNAT BUSINESS MACHINES COR

Supercritical fluid(SCF) silylation process

CLARIANT FINANCE BVI LTD

Method of developing positive photoresist and compositions therefor