P

Inventor

YUDASAKA ICHIO

JP63 patents
⚠️ This page may combine multiple inventors who share the name “YUDASAKA ICHIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SEIKO EPSON CORP

46 patents
US7273801B2Sep 25, 2007

Method of forming thin film patterning substrate including formation of banks

SEIKO EPSON CORP142 citations99
US7214959B2May 8, 2007

Method of forming thin film patterning substrate including formation of banks

SEIKO EPSON CORP159 citations99
US7015503B2Mar 21, 2006

Method of forming thin film patterning substrate including formation of banks

SEIKO EPSON CORP180 citations99
US6476988B1Nov 5, 2002

Thin film forming method, display, and color filter

SEIKO EPSON CORP140 citations99
US6380672B1Apr 30, 2002

Active matrix display device

SEIKO EPSON CORP208 citations99
US6373453B1Apr 16, 2002

Active matrix display

SEIKO EPSON CORP250 citations99
US6359606B1Mar 19, 2002

Active matrix display

SEIKO EPSON CORP293 citations99
US5989945ANov 23, 1999

Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device

SEIKO EPSON CORP182 citations99
US5563427AOct 8, 1996

Active matrix panel and manufacturing method including TFTs having variable impurity concentration levels

SEIKO EPSON CORP196 citations99
US7932518B2Apr 26, 2011

Method of forming thin film patterning substrate including formation of banks

SEIKO EPSON CORP67 citations98
US7442955B2Oct 28, 2008

Method of forming thin film patterning substrate including formation of banks

SEIKO EPSON CORP77 citations98
US6885148B2Apr 26, 2005

Active matrix display device

SEIKO EPSON CORP75 citations98
US6767775B1Jul 27, 2004

Method of manufacturing thin-film transistor

SEIKO EPSON CORP97 citations98
US6734839B2May 11, 2004

Active matrix display device

SEIKO EPSON CORP78 citations98
US6642651B2Nov 4, 2003

Active matrix display device

SEIKO EPSON CORP78 citations98
US6593591B2Jul 15, 2003

Thin film device provided with coating film, liquid crystal panel and electronic device, and method the thin film device

SEIKO EPSON CORP86 citations98
US6541354B1Apr 1, 2003

Method for forming silicon film

SEIKO EPSON CORP102 citations98
US6518087B1Feb 11, 2003

Method for manufacturing solar battery

SEIKO EPSON CORP129 citations98
US6514801B1Feb 4, 2003

Method for manufacturing thin-film transistor

SEIKO EPSON CORP109 citations98
US7364939B2Apr 29, 2008

Active matrix display device

SEIKO EPSON CORP41 citations96
US6884700B2Apr 26, 2005

Method of manufacturing device, device, and electronic apparatus

SEIKO EPSON CORP63 citations96
US6881501B2Apr 19, 2005

Organic electro-luminescence element and the manufacturing method thereof

SEIKO EPSON CORP55 citations96
US6755983B2Jun 29, 2004

Thin film formation method, display, and color filter

SEIKO EPSON CORP54 citations96
US6541918B1Apr 1, 2003

Active-matrix emitting apparatus and fabrication method therefor

SEIKO EPSON CORP69 citations96
US5953582ASep 14, 1999

Active matrix panel manufacturing method including TFTS having variable impurity concentration levels

SEIKO EPSON CORP59 citations96
US5414547AMay 9, 1995

Liquid crystal display device and manufacturing method therefor

SEIKO EPSON CORP238 citations96
US7229859B2Jun 12, 2007

Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device

SEIKO EPSON CORP27 citations93
US7141492B2Nov 28, 2006

Method for forming thin-film, apparatus for forming thin-film, method for manufacturing semiconductor device, electro-optical unit, and electronic apparatus

SEIKO EPSON CORP21 citations93
US7067337B2Jun 27, 2006

Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device

SEIKO EPSON CORP27 citations93
US6967352B2Nov 22, 2005

Thin film formation method, display, and color filter

SEIKO EPSON CORP22 citations93
US6864133B2Mar 8, 2005

Device, method of manufacturing device, electro-optic device, and electronic equipment

SEIKO EPSON CORP34 citations93
US6770936B2Aug 3, 2004

Thin film transistors, and liquid crystal display device and electronic apparatus using the same

SEIKO EPSON CORP28 citations93
US6846513B2Jan 25, 2005

Method for fabricating a silicon thin-film

SEIKO EPSON CORP25 citations92
US7647505B2Jan 12, 2010

Recording medium, recording medium reading/writing apparatus, and method of using recording medium

SEIKO EPSON CORP14 citations84
US7348224B2Mar 25, 2008

Method for manufacturing thin film transistor, electro-optical device and electronic apparatus

SEIKO EPSON CORP9 citations84
US7294155B2Nov 13, 2007

Coating apparatus, thin film forming method, thin film forming apparatus, and semiconductor device manufacturing method, electro-optic device and electronic instrument

SEIKO EPSON CORP13 citations84
US7118943B2Oct 10, 2006

Production method of a thin film device, production method of a transistor, electro-optical apparatus and electronic equipment

SEIKO EPSON CORP17 citations84
US6580129B2Jun 17, 2003

Thin-film transistor and its manufacturing method

SEIKO EPSON CORP14 citations83
US7405134B2Jul 29, 2008

Method of manufacturing a semiconductor device and electronic equipment

SEIKO EPSON CORP7 citations74
US7288792B2Oct 30, 2007

Method of manufacturing semiconductor device, method of manufacturing electronic apparatus, semiconductor device, and electronic apparatus

SEIKO EPSON CORP8 citations74
US7179733B2Feb 20, 2007

Method of forming contact holes and electronic device formed thereby

SEIKO EPSON CORP8 citations74
US6933571B2Aug 23, 2005

Thin film transistors, liquid crystal display device and electronic apparatus using the same

SEIKO EPSON CORP10 citations74
US6765265B2Jul 20, 2004

System and method for manufacturing a thin film transistor

SEIKO EPSON CORP7 citations74
US6548356B2Apr 15, 2003

Thin film transistor

SEIKO EPSON CORP8 citations73
US7524734B2Apr 28, 2009

Wiring substrate, electro-optic device, electric apparatus, method of manufacturing wiring substrate, method of manufacturing electro-optic device, and method of manufacturing electric apparatus

SEIKO EPSON CORP2 citations63
US7265021B2Sep 4, 2007

Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment

SEIKO EPSON CORP3 citations63

CAMBRIDGE DISPLAY TECH LTD

1 patent

CAMBRIDGE DISPLAY TECHNOLOGY

1 patent

YUDASAKA ICHIO

1 patent

TANAKA HIDEKI

1 patent

Showing the top 50 of 63 patents by PatentIndex Score.