Inventor · disambiguated record
Daisuke Morisawa
Also filed as: MORISAWA DAISUKE
10 granted patents·3 pending applications·30 citations·filing 2005–2023
84Inventor score
Top patents by PatentIndex Score
13 records- 0180US7266418B2Substrate processing apparatus, history information recording method, history information recording program, and history information recording systemTOKYO ELECTRON LTD·Filed 2005·Granted Sep 4, 2007·10 cites·10 claims
- 0280US7128304B2Control valve for variable capacity compressorsFUJIKOKI CORP·Filed 2005·Granted Oct 31, 2006·9 cites·9 claims
- 0368US8255072B2Substrate processing apparatus, program, storage medium and conditioning necessity determining methodMORISAWA DAISUKE·Filed 2009·Granted Aug 28, 2012·5 cites·6 claims
- 0465US7987012B2Control device of substrate processing apparatus and control program thereforTOKYO ELECTRON LTD·Filed 2008·Granted Jul 26, 2011·2 cites·8 claims
- 0560US10186422B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Jan 22, 2019·1 cites·5 claims
- 0660US9646864B2Substrate processing system and substrate transfer control methodTOKYO ELECTRON LTD·Filed 2013·Granted May 9, 2017·1 cites·6 claims
- 0756US7690898B2Control valve for variable displacement compressorFUJIKOKI CORP·Filed 2007·Granted Apr 6, 2010·2 cites·14 claims
- 0854US2025183072A1Substrate processing device and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 0953US2009032750A1Control valve for variable capacity compressorsFUJIKOKI CORP·Filed 2008·Application pending·0 cites
- 1046US9845531B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2014·Granted Dec 19, 2017·0 cites·12 claims
- 1139US11101154B2Method of processing target substrateTOKYO ELECTRON LTD·Filed 2018·Granted Aug 24, 2021·0 cites·3 claims
- 1232US9828675B2Processing apparatus and processing methodTOKYO ELECTRON LTD·Filed 2015·Granted Nov 28, 2017·0 cites·13 claims
- 1332US2016307784A1Substrate processing systemTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →