Inventor · disambiguated record
Boo-Deuk Kim
Also filed as: KIM BOO-DEUK
13 granted patents·6 pending applications·20 citations·filing 2004–2017
86Inventor score
Top patents by PatentIndex Score
19 records- 0182US8871423B2Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the sameYUN HYO-JIN·Filed 2011·Granted Oct 28, 2014·6 cites·13 claims
- 0272US7026497B2Adhesive compound and method for forming photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 11, 2006·3 cites·20 claims
- 0363US9899231B2Hard mask composition for spin-coatingSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Feb 20, 2018·1 cites·11 claims
- 0462US7282319B2Photoresist composition and method of forming a pattern using sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Oct 16, 2007·1 cites·21 claims
- 0555US7491484B2Photoresist compositions and methods of forming a pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Feb 17, 2009·4 cites·15 claims
- 0655US7053030B2Silicone hyper-branched polymer surfactant, method of preparing the same and method of rinsing using a rinsing solution comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 30, 2006·2 cites·8 claims
- 0749US7964332B2Methods of forming a pattern of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Jun 21, 2011·3 cites·15 claims
- 0849US7442489B2Photoresist composition and method of forming a photoresist pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Oct 28, 2008·0 cites·16 claims
- 0946US2008311527A1Method of forming protection layer on photoresist pattern and method of forming fine pattern using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1044US7638388B2Method of forming a pattern and method of manufacturing a capacitor using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Dec 29, 2009·0 cites·20 claims
- 1144US2008070155A1Inclusion complex, photoresist composition having the inclusion complex and method of forming a pattern using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1243US10236185B2Method of forming patterns for semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Mar 19, 2019·0 cites·20 claims
- 1343US8685865B2Method of forming patterns of semiconductor devicePARK JEONG-JU·Filed 2012·Granted Apr 1, 2014·0 cites·20 claims
- 1441US2007166644A1Photoresist composition and method of forming a photoresist pattern using the sameKIM BOO-DEUK·Filed 2007·Application pending·0 cites
- 1538US2005266343A1Photoresist composition and method of forming sameKIM KYOUNG-MI·Filed 2005·Application pending·0 cites
- 1637US7026240B2Method of fabricating a semiconductor device having a photo-sensitive polyimide layer and a device fabricated in accordance with the methodSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 11, 2006·0 cites·24 claims
- 1737US2006160020A1Photosensitive polymer, photoresist composition having the photosensitive polymer and method of forming a photoresist pattern using the photoresist compositionRYU JINA·Filed 2006·Application pending·0 cites
- 1835US2017176859A1Photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 1934US7485407B2Siloxane compound, photoresist composition including the siloxane compound and method of forming a pattern using the photoresist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Feb 3, 2009·0 cites·10 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →