Inventor · disambiguated record
Martin Jules Marie-Emile De Nivelle
Also filed as: DE NIVELLE MARTIN J M · DE NIVELLE MARTIN JULES MARIE- · DE NIVELLE MARTIN JULES MARIE-EMILE
8 granted patents·1 pending application·23 citations·filing 2004–2021
82Inventor score
Top patents by PatentIndex Score
9 records- 0181US11662669B2Apparatus and method for measuring substrate heightASML NETHERLANDS BV·Filed 2020·Granted May 30, 2023·2 cites·18 claims
- 0279US11029614B2Level sensor apparatus, method of measuring topographical variation across a substrate, method of measuring variation of a physical parameter related to a lithographic process, and lithographic apparatusASML NETHERLANDS BV·Filed 2017·Granted Jun 8, 2021·2 cites·20 claims
- 0369US8411254B2Device manufacturing method, control system, computer program and computer-readable mediumDE NIVELLE MARTIN JULES MARIE-EMILE·Filed 2009·Granted Apr 2, 2013·4 cites·11 claims
- 0467US7649635B2Method for determining a map, device manufacturing method, and lithographic apparatusASML NETHERLANDS BV·Filed 2007·Granted Jan 19, 2010·2 cites·3 claims
- 0562US7113257B2Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatusASML NETHERLANDS BV·Filed 2004·Granted Sep 26, 2006·9 cites·30 claims
- 0656US7292351B2Method for determining a map, device manufacturing method, and lithographic apparatusASML NETHERLANDS BV·Filed 2004·Granted Nov 6, 2007·4 cites·34 claims
- 0754US12339594B2Substrate level sensing in a lithographic apparatusASML NETHERLANDS BV·Filed 2021·Granted Jun 24, 2025·0 cites·13 claims
- 0841US8174678B2Lithographic apparatus with adjusted exposure slit shape enabling reduction of focus errors due to substrate topology and device manufacturing methodMAGNUSSON SVEN GUNNAR KRISTER·Filed 2008·Granted May 8, 2012·0 cites·19 claims
- 0935US2007262268A1Method for imaging a pattern onto a target portion of a substrateASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
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