Inventor · disambiguated record
Stuart Dimock
Also filed as: DIMOCK STUART · DIMOCK STUART H
8 granted patents·2 pending applications·116 citations·filing 2007–2025
88Inventor score
Top patents by PatentIndex Score
10 records- 0193US8044240B2Polymorphic form of N-(S)-(3,4-difluoro-2-(2-fluoro-4-iodophenylamino)-6-methoxyphenyl)-1-(2,3-dihydroxypropyl)cyclopropane-1-sulfonamide and uses thereofARDEA BIOSCIENCES INC·Filed 2009·Granted Oct 25, 2011·24 cites·10 claims
- 0292US8759577B2Polymorphic form of N-(S)-(3,4-difluoro-2-(2-fluoro-4-iodophenylamino)-6-methoxyphenyl)-1-(2,3-dihydroxypropyl)cyclopropane-1-sulfonamide and uses thereofARDEA BIOSCIENCES INC·Filed 2013·Granted Jun 24, 2014·19 cites·19 claims
- 0391US8648116B2Derivatives of N-(arylamino) sulfonamides including polymorphs as inhibitors of MEK as well as compositions, methods of use and methods for preparing the sameVERNIER JEAN-MICHEL·Filed 2008·Granted Feb 11, 2014·24 cites·25 claims
- 0491US8466316B2Polymorphic form of N-(S)-(3,4-difluoro-2-(2-fluoro-4-iodophenylamino)-6-methoxyphenyl)-1-(2,3-dihydroxypropyl)cyclopropane-1-sulfonamide and uses thereofDIMOCK STUART·Filed 2012·Granted Jun 18, 2013·21 cites·20 claims
- 0591US8252842B2Polymorphic form of N-(S)-(3,4-difluoro-2-(2-fluoro-4-iodophenylamino)-6-methoxyphenyl)-1-(2,3-dihydroxypropyl)cyclopropane-1-sulfonamide and uses thereofDIMOCK STUART·Filed 2011·Granted Aug 28, 2012·21 cites·20 claims
- 0683US7692038B2Crystalline formsPFIZER·Filed 2007·Granted Apr 6, 2010·7 cites·6 claims
- 0782US2025289779A1High purity ethylenediamine for semiconductor applicationsVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 0873US12319637B2High purity ethylenediamine for semiconductor applicationsVERSUM MAT US LLC·Filed 2021·Granted Jun 3, 2025·0 cites·11 claims
- 0964US9174933B2Polymorphic form of N-(S)-(3,4-difluoro-2-(2-fluoro-4-iodophenylamino)-6-methoxyphenyl)-1-(2,3-dihydroxypropyl)cyclopropane-1-sulfonamide and uses thereofARDEA BIOSCIENCES INC·Filed 2014·Granted Nov 3, 2015·0 cites·12 claims
- 1053US2018022691A1High Purity Ethylenediamine for Semiconductor ApplicationsVERSUM MAT US LLC·Filed 2017·Application pending·0 cites
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