Inventor
TAKAIWA HIROAKI
JP32 patents
⚠️ This page may combine multiple inventors who share the name “TAKAIWA HIROAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
19 patentsUS7486380B2Feb 3, 2009
Wafer table for immersion lithography
NIKON CORP46 citations96
US7301607B2Nov 27, 2007
Wafer table for immersion lithography
NIKON CORP48 citations96
US7990517B2Aug 2, 2011
Immersion exposure apparatus and device manufacturing method with residual liquid detector
NIKON CORP13 citations92
US7990516B2Aug 2, 2011
Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
NIKON CORP11 citations92
US7847916B2Dec 7, 2010
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
NIKON CORP12 citations92
US7826031B2Nov 2, 2010
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
NIKON CORP21 citations92
US8749757B2Jun 10, 2014
Exposure apparatus, method for producing device, and method for controlling exposure apparatus
NIKON CORP4 citations83
US8054447B2Nov 8, 2011
Exposure apparatus, exposure method, method for producing device, and optical part
NIKON CORP11 citations83
US9019467B2Apr 28, 2015
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP2 citations62
US10151983B2Dec 11, 2018
Exposure apparatus and device manufacturing method
NIKON CORP0 citations52
US10012909B2Jul 3, 2018
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
NIKON CORP0 citations52
US9268237B2Feb 23, 2016
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP0 citations52
US9041906B2May 26, 2015
Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate
NIKON CORP0 citations52
US8867017B2Oct 21, 2014
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
NIKON CORP0 citations52
US8384880B2Feb 26, 2013
Exposure method, substrate stage, exposure apparatus, and device manufacturing method
NIKON CORP0 citations52
US8034539B2Oct 11, 2011
Exposure apparatus and method for producing device
NIKON CORP1 citations52
US7973910B2Jul 5, 2011
Stage apparatus and exposure apparatus
NIKON CORP1 citations52
US10088760B2Oct 2, 2018
Exposure apparatus, exposure method, method for producing device, and optical part
NIKON CORP0 citations51
US9182685B2Nov 10, 2015
Exposure apparatus, exposure method, method for producing device, and optical part
NIKON CORP0 citations51
HARA HIDEAKI
3 patentsUS9041901B2May 26, 2015
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
HARA HIDEAKI2 citations62
US8854599B2Oct 7, 2014
Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method
HARA HIDEAKI0 citations52
US9223224B2Dec 29, 2015
Exposure apparatus with component from which liquid is protected and/or removed and device fabricating method
HARA HIDEAKI0 citations41
TAKAIWA HIROAKI
3 patentsUS8488101B2Jul 16, 2013
Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position
TAKAIWA HIROAKI2 citations61
US8767168B2Jul 1, 2014
Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure
TAKAIWA HIROAKI0 citations50
US8749755B2Jun 10, 2014
Stage apparatus and exposure apparatus
TAKAIWA HIROAKI1 citations50