Exposure apparatus, exposure method, method for producing device, and optical part

Abstract

An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid ( 1 ). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member ( 30 ) having a liquid repellent flat surface ( 30 A) is replaceably provided to the substrate table (PT) to prevent the liquid from remaining, maintaining excellent exposure accuracy.

The invention claimed is: 
     
       1. A measuring system which measures an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, the measuring system comprising:
 at least one structure carrier provided to be arranged in a region of the immersion liquid, each of the at least one structure carrier comprising:
 an optical member comprising a substrate; 
 a coating, the coating being applied to at least a portion of at least one surface of the substrate; and 
 a protective system including a multi-layer structure which covers the optical member and the coating 
 
 wherein the multi-layer structure forms at least a portion of a liquid-repellent barrier. 
 
     
     
       2. The measuring system as claimed in  claim 1 , further comprising:
 A detector for receiving light from the imaging system. 
 
     
     
       3. The measuring system as claimed in  claim 1 , wherein the coating comprises a metal such as chromium. 
     
     
       4. The measuring system as claimed in  claim 1 , wherein the protective system is applied in relation to the coating and the substrate in such a way that the coating is enclosed by the substrate and the protective system in a manner which is substantially liquid-tight on all sides. 
     
     
       5. The measuring system as claimed in  claim 1 , wherein the multi-layer structure is transparent to measuring radiation. 
     
     
       6. The measuring system as claimed in  claim 1 , wherein the multi-layer structure is substantially impermeable to the immersion liquid. 
     
     
       7. The measuring system as claimed in  claim 6 , wherein at least one of the layers of the multi-layer structure is substantially chemically resistant to the immersion liquid. 
     
     
       8. The measuring system as claimed in  claim 1 , wherein the multi-layer structure includes a layer of silicon dioxide. 
     
     
       9. A liquid immersion exposure apparatus in which a wafer is exposed, the apparatus comprising:
 an optical imaging system which is provided to image a pattern; and 
 the measuring system of  claim 1 . 
 
     
     
       10. The apparatus according to  claim 9 , further comprising an exchangeable component which has a liquid-repellent surface. 
     
     
       11. The apparatus according to  claim 10 , wherein the liquid-repellent surface of the component is arranged to surround the wafer. 
     
     
       12. The measuring system as claimed in  claim 1 , further comprising a measuring structure that comprises an optical shielding portion, and wherein the optical shielding portion is not part of the multi-layer structure of the protective system. 
     
     
       13. The measuring system as claimed in  claim 1 , wherein
 at least a portion of the protective system including the multi-layer structure which covers the optical member and the coating is arranged on an immersion-liquid-side of the at least one structure carrier, such that at least a portion of the protective system including the multi-layer structure is arranged between the immersion liquid and the coating, and 
 at least a portion of the optical member is coplanar with a top surface of the coating, the top surface of the coating being a side of the coating nearest to the immersion-liquid-side of the at least one structure carrier. 
 
     
     
       14. The measuring system as claimed in  claim 1 , wherein the coating includes a light-shielding material. 
     
     
       15. A structure carrier for a measuring system which measures an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, the structure carrier comprising:
 an optical member comprising a substrate; 
 a coating applied to at least a portion of a surface of the substrate; and 
 a protective system that covers the coating and includes a multi-layer structure, 
 wherein the multi-layer structure forms at least a portion of a liquid-repellent barrier. 
 
     
     
       16. The structure carrier as claimed in  claim 15 , wherein at least one pinhole is formed in the coating. 
     
     
       17. The structure carrier as claimed in  claim 15 , wherein the multi-layer structure is transparent to measuring radiation and is substantially impermeable to the immersion liquid. 
     
     
       18. The structure carrier as claimed in  claim 17 , wherein the multi-layer structure includes a layer of silicon dioxide. 
     
     
       19. The structure carrier as claimed in  claim 15 , further comprising at least one measuring structure, each of the at least one measuring structure comprising an optical shielding portion, and wherein the optical shielding portion is not part of the multi-layer structure of the protective system. 
     
     
       20. The structure carrier as claimed in  claim 15 , wherein the coating includes a light-shielding material. 
     
     
       21. A structure carrier for a measuring system which measures an optical imaging system which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, the imaging system being designed as an immersion system for imaging with the aid of an immersion liquid arranged on an image-side of the imaging system, the structure carrier comprising:
 a diaphragm structure that is configured to restrict a measuring field; and 
 a protective system, the protective system covering the diaphragm structure and including a multi-layer structure that forms at least a portion of a liquid-repellent barrier. 
 
     
     
       22. The structure carrier as claimed in  claim 21 , wherein the diaphragm structure comprises an optical shielding portion, and wherein the optical shielding portion is not part of a multi-layer structure of the protective system. 
     
     
       23. The structure carrier as claimed in  claim 21 , wherein the diaphragm structure includes a light-shielding material.