P

Inventor

ASANO MASAFUMI

JP42 patents
⚠️ This page may combine multiple inventors who share the name “ASANO MASAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOSHIBA KK

31 patents
US6813001B2Nov 2, 2004

Exposure method and apparatus

TOSHIBA KK20 citations92
US6741334B2May 25, 2004

Exposure method, exposure system and recording medium

TOSHIBA KK28 citations92
US6701512B2Mar 2, 2004

Focus monitoring method, exposure apparatus, and exposure mask

TOSHIBA KK43 citations92
US6667139B2Dec 23, 2003

Method of manufacturing semiconductor device

TOSHIBA KK35 citations92
US7812972B2Oct 12, 2010

Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle

TOSHIBA KK8 citations84
US7742834B2Jun 22, 2010

Management system of semiconductor fabrication apparatus, abnormality factor extraction method of semiconductor fabrication apparatus, and management method of the same

TOSHIBA KK11 citations84
US7396621B2Jul 8, 2008

Exposure control method and method of manufacturing a semiconductor device

TOSHIBA KK13 citations84
US7250235B2Jul 31, 2007

Focus monitor method and mask

TOSHIBA KK15 citations84
US6866976B2Mar 15, 2005

Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit

TOSHIBA KK14 citations84
US8381138B2Feb 19, 2013

Simulation model creating method, computer program product, and method of manufacturing a semiconductor device

TOSHIBA KK8 citations83
US7510341B2Mar 31, 2009

Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus

TOSHIBA KK14 citations82
US7629550B2Dec 8, 2009

System of testing semiconductor devices, a method for testing semiconductor devices, and a method for manufacturing semiconductor devices

TOSHIBA KK6 citations74
US7432021B2Oct 7, 2008

Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle

TOSHIBA KK6 citations74
US7175943B2Feb 13, 2007

Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device

TOSHIBA KK9 citations74
US9433967B2Sep 6, 2016

Pattern inspection method, pattern formation control method, and pattern inspection apparatus

TOSHIBA KK3 citations73
US7982155B2Jul 19, 2011

System of testing semiconductor devices, a method for testing semiconductor devices, and a method for manufacturing semiconductor devices

TOSHIBA KK2 citations63
US7655369B2Feb 2, 2010

Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device

TOSHIBA KK1 citations63
US7184913B2Feb 27, 2007

Testing system, a computer implemented testing method and a method for manufacturing electronic devices

TOSHIBA KK2 citations63
US7979154B2Jul 12, 2011

Method and system for managing semiconductor manufacturing device

TOSHIBA KK3 citations62
US7883824B2Feb 8, 2011

Method for evaluating lithography apparatus and method for controlling lithography apparatus

TOSHIBA KK3 citations62
USRE46390EMay 2, 2017

Pattern forming method, processing method, and processing apparatus

TOSHIBA KK0 citations52
US8722535B2May 13, 2014

Pattern forming method, mold and data processing method

TOSHIBA KK0 citations52
US8055366B2Nov 8, 2011

Simulation model creating method, mask data creating method and semiconductor device manufacturing method

TOSHIBA KK1 citations52
US7970486B2Jun 28, 2011

Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus

TOSHIBA KK1 citations52
US7930123B2Apr 19, 2011

Method, apparatus, and computer readable medium for evaluating a sampling inspection

TOSHIBA KK1 citations52
US7855047B2Dec 21, 2010

Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device

TOSHIBA KK0 citations52
US7756656B2Jul 13, 2010

Measurement coordinate setting system and method

TOSHIBA KK1 citations52
US7476473B2Jan 13, 2009

Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method

TOSHIBA KK1 citations52
US7103503B2Sep 5, 2006

Testing system, a computer implemented testing method and a method for manufacturing electronic devices

TOSHIBA KK0 citations52
US7047147B2May 16, 2006

Testing system, a computer implemented testing method and a method for manufacturing electronic devices

TOSHIBA KK0 citations52
US7537869B2May 26, 2009

Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process

TOSHIBA KK0 citations42

TOKYO SHIBAURA ELECTRIC CO

3 patents

FUJITSU LTD

2 patents

TOSHIBA MEMORY CORP

2 patents

KABUSHIKI KAISAHA TOSHIBA

1 patent

KIOXIA CORP

1 patent

ASANO MASAFUMI

1 patent

TAKEKAWA YOKO

1 patent