Inventor
ASANO MASAFUMI
JP42 patents
⚠️ This page may combine multiple inventors who share the name “ASANO MASAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
31 patentsUS6813001B2Nov 2, 2004
Exposure method and apparatus
TOSHIBA KK20 citations92
US6741334B2May 25, 2004
Exposure method, exposure system and recording medium
TOSHIBA KK28 citations92
US6701512B2Mar 2, 2004
Focus monitoring method, exposure apparatus, and exposure mask
TOSHIBA KK43 citations92
US6667139B2Dec 23, 2003
Method of manufacturing semiconductor device
TOSHIBA KK35 citations92
US7812972B2Oct 12, 2010
Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
TOSHIBA KK8 citations84
US7742834B2Jun 22, 2010
Management system of semiconductor fabrication apparatus, abnormality factor extraction method of semiconductor fabrication apparatus, and management method of the same
TOSHIBA KK11 citations84
US7396621B2Jul 8, 2008
Exposure control method and method of manufacturing a semiconductor device
TOSHIBA KK13 citations84
US7250235B2Jul 31, 2007
Focus monitor method and mask
TOSHIBA KK15 citations84
US6866976B2Mar 15, 2005
Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
TOSHIBA KK14 citations84
US8381138B2Feb 19, 2013
Simulation model creating method, computer program product, and method of manufacturing a semiconductor device
TOSHIBA KK8 citations83
US7510341B2Mar 31, 2009
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
TOSHIBA KK14 citations82
US7629550B2Dec 8, 2009
System of testing semiconductor devices, a method for testing semiconductor devices, and a method for manufacturing semiconductor devices
TOSHIBA KK6 citations74
US7432021B2Oct 7, 2008
Reticle, apparatus for monitoring optical system, method for monitoring optical system, and method for manufacturing reticle
TOSHIBA KK6 citations74
US7175943B2Feb 13, 2007
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK9 citations74
US9433967B2Sep 6, 2016
Pattern inspection method, pattern formation control method, and pattern inspection apparatus
TOSHIBA KK3 citations73
US7982155B2Jul 19, 2011
System of testing semiconductor devices, a method for testing semiconductor devices, and a method for manufacturing semiconductor devices
TOSHIBA KK2 citations63
US7655369B2Feb 2, 2010
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK1 citations63
US7184913B2Feb 27, 2007
Testing system, a computer implemented testing method and a method for manufacturing electronic devices
TOSHIBA KK2 citations63
US7979154B2Jul 12, 2011
Method and system for managing semiconductor manufacturing device
TOSHIBA KK3 citations62
US7883824B2Feb 8, 2011
Method for evaluating lithography apparatus and method for controlling lithography apparatus
TOSHIBA KK3 citations62
USRE46390EMay 2, 2017
Pattern forming method, processing method, and processing apparatus
TOSHIBA KK0 citations52
US8722535B2May 13, 2014
Pattern forming method, mold and data processing method
TOSHIBA KK0 citations52
US8055366B2Nov 8, 2011
Simulation model creating method, mask data creating method and semiconductor device manufacturing method
TOSHIBA KK1 citations52
US7970486B2Jun 28, 2011
Method for controlling semiconductor manufacturing apparatus and control system of semiconductor manufacturing apparatus
TOSHIBA KK1 citations52
US7930123B2Apr 19, 2011
Method, apparatus, and computer readable medium for evaluating a sampling inspection
TOSHIBA KK1 citations52
US7855047B2Dec 21, 2010
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK0 citations52
US7756656B2Jul 13, 2010
Measurement coordinate setting system and method
TOSHIBA KK1 citations52
US7476473B2Jan 13, 2009
Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method
TOSHIBA KK1 citations52
US7103503B2Sep 5, 2006
Testing system, a computer implemented testing method and a method for manufacturing electronic devices
TOSHIBA KK0 citations52
US7047147B2May 16, 2006
Testing system, a computer implemented testing method and a method for manufacturing electronic devices
TOSHIBA KK0 citations52
US7537869B2May 26, 2009
Evaluation of pattern formation process, photo masks for the evaluation, and fabrication method of a semiconductor device with the evaluation process
TOSHIBA KK0 citations42
TOKYO SHIBAURA ELECTRIC CO
3 patentsUS4339340AJul 13, 1982
Surface-treating agent adapted for intermediate products of a semiconductor device
TOKYO SHIBAURA ELECTRIC CO75 citations94
US4239661ADec 16, 1980
Surface-treating agent adapted for intermediate products of a semiconductor device
TOKYO SHIBAURA ELECTRIC CO96 citations94
US4172005AOct 23, 1979
Method of etching a semiconductor substrate
TOKYO SHIBAURA ELECTRIC CO44 citations91