P

Inventor

BINDER HORST

DE40 patents
⚠️ This page may combine multiple inventors who share the name “BINDER HORST”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BASF AG

24 patents
US4883740ANov 28, 1989

Radiation-sensitive mixture for photosensitive coating materials

BASF AG116 citations96
US5075199ADec 24, 1991

Radiation sensitive mixture and production of relief patterns

BASF AG31 citations93
US5073474ADec 17, 1991

Radiation-sensitive mixture containing acid labile groups and production of relief patterns

BASF AG22 citations93
US5118585AJun 2, 1992

Positive and negative working radiation sensitive mixtures and production of relief patterns

BASF AG20 citations82
US5084371AJan 28, 1992

Positive-working, radiation-sensitive mixture based on acid-cleavable and photochemically acid-forming compounds, and the production of relief patterns and relief images

BASF AG19 citations82
US5914219AJun 22, 1999

Radiation-sensitive mixture and the production of relief structures having improved contrast

BASF AG13 citations74
US5783354AJul 21, 1998

Positive-working radiation-sensitive mixture

BASF AG9 citations74
US5759750AJun 2, 1998

Radiation-sensitive mixture

BASF AG11 citations74
US5563022AOct 8, 1996

Positive-working radiation-sensitive mixture and the production of relief patterns

BASF AG11 citations74
US5318876AJun 7, 1994

Radiation-sensitive mixture containing acid-labile groups and production of relief patterns

BASF AG11 citations74
US5252436AOct 12, 1993

Process for developing a positive-working photoresist containing poly(p-hydroxystyrene) and sulfonium salt with an aqueous developer containing basic organic compounds

BASF AG10 citations74
US5069998ADec 3, 1991

Radiation sensitive mixture and production of relief patterns

BASF AG15 citations74
US5039595AAug 13, 1991

Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists

BASF AG12 citations74
US5034305AJul 23, 1991

Radiation-sensitive mixture

BASF AG15 citations74
US4913949AApr 3, 1990

Planar, multilayered, laser-optical recording material

BASF AG17 citations74
US4812542AMar 14, 1989

Copolymers having o-nitrocarbinol ester groups and preparation thereof

BASF AG7 citations74
US7888424B2Feb 15, 2011

Method for producing a curable aqueous polymer dispersion

BASF AG2 citations63
US6774198B2Aug 10, 2004

Partially branched polymers

BASF AG6 citations63
US5846689ADec 8, 1998

Positive-working radiation-sensitive mixture and production of relief structures

BASF AG2 citations63
US5300400AApr 5, 1994

Process for the production of relief patterns and images utilizing an organic compound having at least one acid-cleavable group and a storage stability improving amount of a second organic compound

BASF AG4 citations63
US4822866AApr 18, 1989

Copolymers having O-nitrocarbinol ester groups and production of semiconductor components

BASF AG2 citations63
US4808682AFeb 28, 1989

Copolymers having o-nitrocarbinol ester groups, production of two-layer resists, and fabrication of semiconductor components

BASF AG6 citations63
US6696505B2Feb 24, 2004

Preparation of polyurethane foams

BASF AG2 citations61
USRE35217EApr 23, 1996

Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists

BASF AG1 citations52

BINDER HORST

3 patents

BASF SE

3 patents

BASF COATINGS AG

2 patents

DRAEGERWERK AG

2 patents

KEIL & WEINKAUF

1 patent

BAYERISCHE MOTEREN WERKE AKTIE

1 patent

MERCK PATENT GMBH

1 patent

BATTELLE INSTITUT E V

1 patent

JOKISCH CARL

1 patent

LESCHINSKI JULIA

1 patent