Inventor · disambiguated record
John C. Forster
Also filed as: FORSTER JOHN C · FORSTER JOHN CURT
13 granted patents·1 pending application·884 citations·filing 1991–2018
94Inventor score
Top patents by PatentIndex Score
14 records- 0199US5178739AApparatus for depositing material into high aspect ratio holesIBM·Filed 1991·Granted Jan 12, 1993·429 cites·24 claims
- 0294US5650032AApparatus for producing an inductive plasma for plasma processesIBM·Filed 1995·Granted Jul 22, 1997·92 cites·26 claims
- 0391US5312717AResidue free vertical pattern transfer with top surface imaging resistsIBM·Filed 1992·Granted May 17, 1994·78 cites·4 claims
- 0488US5189446APlasma wafer processing tool having closed electron cyclotron resonanceIBM·Filed 1991·Granted Feb 23, 1993·58 cites·11 claims
- 0579US5208512AScanned electron cyclotron resonance plasma sourceIBM·Filed 1992·Granted May 4, 1993·34 cites·15 claims
- 0675US5382911AReaction chamber interelectrode gap monitoring by capacitance measurementIBM·Filed 1993·Granted Jan 17, 1995·32 cites·5 claims
- 0775US5207437ACeramic electrostatic wafer chuckIBM·Filed 1991·Granted May 4, 1993·57 cites·7 claims
- 0868US5332441AApparatus for gettering of particles during plasma processingIBM·Filed 1991·Granted Jul 26, 1994·17 cites·10 claims
- 0966US5433258AGettering of particles during plasma processingIBM·Filed 1994·Granted Jul 18, 1995·15 cites·9 claims
- 1063US5284549ASelective fluorocarbon-based RIE process utilizing a nitrogen additiveIBM·Filed 1992·Granted Feb 8, 1994·36 cites·6 claims
- 1156US5518547AMethod and apparatus for reducing particulates in a plasma tool through steady state flowsIBM·Filed 1993·Granted May 21, 1996·15 cites·14 claims
- 1255US5543184AMethod of reducing particulates in a plasma tool through steady state flowsIBM·Filed 1995·Granted Aug 6, 1996·10 cites·9 claims
- 1343US5926689AProcess for reducing circuit damage during PECVD in single wafer PECVD systemIBM·Filed 1995·Granted Jul 20, 1999·11 cites·3 claims
- 1440US2019196461A1Internet-based semiconductor manufacturing equipment health and diagnostics monitoringAPPLIED MATERIALS INC·Filed 2018·Application pending·0 cites
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