Assignee
APPLIED MATERIALS INC
US5,000+ patents
Top patents by PatentIndex Score
US11018003B2May 25, 2021
Method of selective silicon germanium epitaxy at low temperatures
APPLIED MATERIALS INC312 citations99
US10950477B2Mar 16, 2021
Ceramic heater and esc with enhanced wafer edge performance
APPLIED MATERIALS INC280 citations99
US10400335B2Sep 3, 2019
Dual-direction chemical delivery system for ALD/CVD chambers
APPLIED MATERIALS INC363 citations99
US10121671B2Nov 6, 2018
Methods of depositing metal films using metal oxyhalide precursors
APPLIED MATERIALS INC429 citations99
US9991134B2Jun 5, 2018
Processing systems and methods for halide scavenging
APPLIED MATERIALS INC100 citations99
US9934942B1Apr 3, 2018
Chamber with flow-through source
APPLIED MATERIALS INC108 citations99
US9850573B1Dec 26, 2017
Non-line of sight deposition of erbium based plasma resistant ceramic coating
APPLIED MATERIALS INC347 citations99
US9842744B2Dec 12, 2017
Methods for etch of SiN films
APPLIED MATERIALS INC113 citations99
US9837284B2Dec 5, 2017
Oxide etch selectivity enhancement
APPLIED MATERIALS INC112 citations99
US9837249B2Dec 5, 2017
Radial waveguide systems and methods for post-match control of microwaves
APPLIED MATERIALS INC111 citations99
USD801942SNov 7, 2017
Target profile for a physical vapor deposition chamber target
APPLIED MATERIALS INC336 citations99
US9765432B2Sep 19, 2017
Dual-direction chemical delivery system for ALD/CVD chambers
APPLIED MATERIALS INC362 citations99
US9741546B2Aug 22, 2017
Symmetric plasma process chamber
APPLIED MATERIALS INC385 citations99
USD794753SAug 15, 2017
Showerhead for a semiconductor processing chamber
APPLIED MATERIALS INC303 citations99
USD793526SAug 1, 2017
Showerhead for a semiconductor processing chamber
APPLIED MATERIALS INC302 citations99
US9704723B2Jul 11, 2017
Processing systems and methods for halide scavenging
APPLIED MATERIALS INC114 citations99
US9659792B2May 23, 2017
Processing systems and methods for halide scavenging
APPLIED MATERIALS INC125 citations99
USD784276SApr 18, 2017
Susceptor assembly
APPLIED MATERIALS INC333 citations99
US9613822B2Apr 4, 2017
Oxide etch selectivity enhancement
APPLIED MATERIALS INC128 citations99
US9607856B2Mar 28, 2017
Selective titanium nitride removal
APPLIED MATERIALS INC126 citations99
US9583333B2Feb 28, 2017
Low temperature silicon nitride films using remote plasma CVD technology
APPLIED MATERIALS INC339 citations99
US9564296B2Feb 7, 2017
Radial waveguide systems and methods for post-match control of microwaves
APPLIED MATERIALS INC129 citations99
US9520303B2Dec 13, 2016
Aluminum selective etch
APPLIED MATERIALS INC131 citations99
US9496167B2Nov 15, 2016
Integrated bit-line airgap formation and gate stack post clean
APPLIED MATERIALS INC132 citations99
US9478432B2Oct 25, 2016
Silicon oxide selective removal
APPLIED MATERIALS INC129 citations99
US9478434B2Oct 25, 2016
Chlorine-based hardmask removal
APPLIED MATERIALS INC134 citations99
US9449843B1Sep 20, 2016
Selectively etching metals and metal nitrides conformally
APPLIED MATERIALS INC399 citations99
US9449850B2Sep 20, 2016
Processing systems and methods for halide scavenging
APPLIED MATERIALS INC135 citations99
US9449845B2Sep 20, 2016
Selective titanium nitride etching
APPLIED MATERIALS INC138 citations99
US9437451B2Sep 6, 2016
Radical-component oxide etch
APPLIED MATERIALS INC134 citations99
US9418858B2Aug 16, 2016
Selective etch of silicon by way of metastable hydrogen termination
APPLIED MATERIALS INC138 citations99
US9412608B2Aug 9, 2016
Dry-etch for selective tungsten removal
APPLIED MATERIALS INC134 citations99
US9384997B2Jul 5, 2016
Dry-etch selectivity
APPLIED MATERIALS INC146 citations99
US9378969B2Jun 28, 2016
Low temperature gas-phase carbon removal
APPLIED MATERIALS INC529 citations99
US9373517B2Jun 21, 2016
Semiconductor processing with DC assisted RF power for improved control
APPLIED MATERIALS INC137 citations99
US9368364B2Jun 14, 2016
Silicon etch process with tunable selectivity to SiO2 and other materials
APPLIED MATERIALS INC146 citations99
US9362130B2Jun 7, 2016
Enhanced etching processes using remote plasma sources
APPLIED MATERIALS INC138 citations99
US9355863B2May 31, 2016
Non-local plasma oxide etch
APPLIED MATERIALS INC130 citations99
US9353440B2May 31, 2016
Dual-direction chemical delivery system for ALD/CVD chambers
APPLIED MATERIALS INC373 citations99
US9355922B2May 31, 2016
Systems and methods for internal surface conditioning in plasma processing equipment
APPLIED MATERIALS INC150 citations99
US9349605B1May 24, 2016
Oxide etch selectivity systems and methods
APPLIED MATERIALS INC156 citations99
US9343327B2May 17, 2016
Methods for etch of sin films
APPLIED MATERIALS INC147 citations99
US9309598B2Apr 12, 2016
Oxide and metal removal
APPLIED MATERIALS INC560 citations99
US9299538B2Mar 29, 2016
Radial waveguide systems and methods for post-match control of microwaves
APPLIED MATERIALS INC154 citations99
US9299537B2Mar 29, 2016
Radial waveguide systems and methods for post-match control of microwaves
APPLIED MATERIALS INC160 citations99
US9299583B1Mar 29, 2016
Aluminum oxide selective etch
APPLIED MATERIALS INC160 citations99
US9299575B2Mar 29, 2016
Gas-phase tungsten etch
APPLIED MATERIALS INC163 citations99
US9293568B2Mar 22, 2016
Method of fin patterning
APPLIED MATERIALS INC150 citations99
US9287134B2Mar 15, 2016
Titanium oxide etch
APPLIED MATERIALS INC153 citations99
US9275834B1Mar 1, 2016
Selective titanium nitride etch
APPLIED MATERIALS INC554 citations99
Showing the top 50 of 5,000+ patents by PatentIndex Score.