Inventor · disambiguated record
Herve A. Besaucele
Also filed as: BESAUCELE HERVE A · BESAUCELE HERVE ANDRE · BESAUCÈLE HERVÉ
24 granted patents·2,051 citations·filing 1998–2017
97Inventor score
Top patents by PatentIndex Score
24 records- 0199US6567450B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted May 20, 2003·265 cites·52 claims
- 0299US6005879APulse energy control for excimer laserCYMER INC·Filed 1998·Granted Dec 21, 1999·231 cites·13 claims
- 0398US6625191B2Very narrow band, two chamber, high rep rate gas discharge laser systemCYMER INC·Filed 2001·Granted Sep 23, 2003·236 cites·78 claims
- 0498US6128323AReliable modular production quality narrow-band high REP rate excimer laserCYMER INC·Filed 1998·Granted Oct 3, 2000·284 cites·56 claims
- 0598US6018537AReliable, modular, production quality narrow-band high rep rate F2 laserCYMER INC·Filed 1999·Granted Jan 25, 2000·280 cites·37 claims
- 0698US5991324AReliable. modular, production quality narrow-band KRF excimer laserCYMER INC·Filed 1998·Granted Nov 23, 1999·196 cites·16 claims
- 0793US7567607B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2006·Granted Jul 28, 2009·14 cites·3 claims
- 0893US6704339B2Lithography laser with beam delivery and beam pointing controlCYMER INC·Filed 2002·Granted Mar 9, 2004·50 cites·80 claims
- 0992USRE38054EReliable, modular, production quality narrow-band high rep rate F2 laserCYMER INC·Filed 2001·Granted Apr 1, 2003·42 cites·37 claims
- 1090US6985508B2Very narrow band, two chamber, high reprate gas discharge laser systemCYMER INC·Filed 2003·Granted Jan 10, 2006·29 cites·23 claims
- 1190US6330261B1Reliable, modular, production quality narrow-band high rep rate ArF excimer laserCYMER INC·Filed 1999·Granted Dec 11, 2001·105 cites·44 claims
- 1290US6067306ALaser-illuminated stepper or scanner with energy sensor feedbackCYMER INC·Filed 1998·Granted May 23, 2000·84 cites·19 claims
- 1389US6188710B1Narrow band gas discharge laser with gas additiveCYMER INC·Filed 1999·Granted Feb 13, 2001·82 cites·5 claims
- 1487US7835414B2Laser gas injection systemCYMER INC·Filed 2007·Granted Nov 16, 2010·13 cites·10 claims
- 1586US5978405ALaser chamber with minimized acoustic and shock wave disturbancesCYMER INC·Filed 1998·Granted Nov 2, 1999·68 cites·23 claims
- 1685US6801560B2Line selected F2 two chamber laser systemCYMER INC·Filed 2002·Granted Oct 5, 2004·18 cites·77 claims
- 1782US7061961B2Very narrow band, two chamber, high rep-rate gas discharge laser systemCYMER INC·Filed 2005·Granted Jun 13, 2006·5 cites·20 claims
- 1878US7471708B2Gas discharge laser output light beam parameter controlCYMER INC·Filed 2005·Granted Dec 30, 2008·6 cites·26 claims
- 1974US7741639B2Multi-chambered excimer or molecular fluorine gas discharge laser fluorine injection controlCYMER INC·Filed 2004·Granted Jun 22, 2010·12 cites·288 claims
- 2069US6553049B1ArF laser with low pulse energy and high rep rateCYMER INC·Filed 1999·Granted Apr 22, 2003·22 cites·18 claims
- 2163US7058107B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted Jun 6, 2006·5 cites·77 claims
- 2260US7218661B2Line selected F2 two chamber laser systemCYMER INC·Filed 2004·Granted May 15, 2007·4 cites·77 claims
- 2341US10763070B2Low pressure wire ion plasma discharge source, and application to electron source with secondary emissionLASER SYSTEMS & SOLUTIONS OF EUROPE·Filed 2017·Granted Sep 1, 2020·0 cites·6 claims
- 2432US9779945B2Method and apparatus for irradiating a semiconductor material surface by laser energyBESAUCÈLE HERVÉ·Filed 2011·Granted Oct 3, 2017·0 cites·12 claims
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