Inventor
MATHUNI JOSEF
DE15 patents
⚠️ This page may combine multiple inventors who share the name “MATHUNI JOSEF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SIEMENS AG
6 patentsUS5945351AAug 31, 1999
Method for etching damaged zones on an edge of a semiconductor substrate, and etching system
SIEMENS AG193 citations98
US5693182ADec 2, 1997
Method for damage etching the back side of a semiconductor disk having a protected front side
SIEMENS AG51 citations95
US6013136AJan 11, 2000
Apparatus for plasma-supported back etching of a semiconductor wafer
SIEMENS AG18 citations92
US5874366AFeb 23, 1999
Method for etching a semiconductor substrate and etching system
SIEMENS AG15 citations71
US4390394AJun 28, 1983
Method of structuring with metal oxide masks by reactive ion-beam etching
SIEMENS AG17 citations66
US5073515ADec 17, 1991
Method for manufacturing a trench capacitor of a one-transistor memory cell in a semiconductor substrate with a self-aligned capacitor plate electrode
SIEMENS AG4 citations60
INFINEON TECHNOLOGIES AG
5 patentsUS7063921B2Jun 20, 2006
Photomask, in particular alternating phase shift mask, with compensation structure
INFINEON TECHNOLOGIES AG7 citations63
US7071110B2Jul 4, 2006
Process for the plasma etching of materials not containing silicon
INFINEON TECHNOLOGIES AG0 citations51
US6569772B2May 27, 2003
Method for producing an alternating phase mask
INFINEON TECHNOLOGIES AG1 citations51
US6152073ANov 28, 2000
Assembly for the manufacture of highly integrated circuits on a semiconductor substrate
INFINEON TECHNOLOGIES AG1 citations51
US6919147B2Jul 19, 2005
Production method for a halftone phase mask
INFINEON TECHNOLOGIES AG1 citations42