Inventor
IINUMA TOSHIHIKO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “IINUMA TOSHIHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
29 patentsUS6376888B1Apr 23, 2002
Semiconductor device and method of manufacturing the same
TOSHIBA KK175 citations99
US6054355AApr 25, 2000
Method of manufacturing a semiconductor device which includes forming a dummy gate
TOSHIBA KK338 citations99
US6570217B1May 27, 2003
Semiconductor device and method of manufacturing the same
TOSHIBA KK96 citations98
US6515338B1Feb 4, 2003
Semiconductor device and manufacturing method therefor
TOSHIBA KK82 citations98
US6664592B2Dec 16, 2003
Semiconductor device with groove type channel structure
TOSHIBA KK60 citations96
US5989988ANov 23, 1999
Semiconductor device and method of manufacturing the same
TOSHIBA KK76 citations96
US7091114B2Aug 15, 2006
Semiconductor device and method of manufacturing the same
TOSHIBA KK38 citations93
US6465823B1Oct 15, 2002
Dynamic threshold voltage metal insulator semiconductor effect transistor
TOSHIBA KK26 citations93
US7372108B2May 13, 2008
Semiconductor device and manufacturing method thereof
TOSHIBA KK18 citations92
US6924518B2Aug 2, 2005
Semiconductor device and method of manufacturing the same
TOSHIBA KK27 citations92
US5510647AApr 23, 1996
Semiconductor device and method of manufacturing the same
TOSHIBA KK26 citations92
US7078345B2Jul 18, 2006
Method for manufacturing a semiconductor device
TOSHIBA KK9 citations74
US6893928B2May 17, 2005
Semiconductor device and method of manufacturing the same
TOSHIBA KK10 citations74
US6794720B2Sep 21, 2004
Dynamic threshold voltage metal insulator field effect transistor
TOSHIBA KK10 citations74
US6770942B2Aug 3, 2004
Semiconductor device having silicide film formed in a part of source-drain diffusion layers and method of manufacturing the same
TOSHIBA KK8 citations74
US9613979B2Apr 4, 2017
Semiconductor memory device and method of manufacturing the same
TOSHIBA KK4 citations73
US9412754B1Aug 9, 2016
Semiconductor memory device and production method thereof
TOSHIBA KK6 citations73
US9153656B2Oct 6, 2015
NAND type nonvolatile semiconductor memory device and method for manufacturing same
TOSHIBA KK4 citations73
US5637909AJun 10, 1997
Semiconductor device and method of manufacturing the same
TOSHIBA KK5 citations73
US7741220B2Jun 22, 2010
Semiconductor device and manufacturing method thereof
TOSHIBA KK5 citations63
US7242064B2Jul 10, 2007
Semiconductor device and method of manufacturing the same
TOSHIBA KK4 citations63
US7902030B2Mar 8, 2011
Manufacturing method for semiconductor device and semiconductor device
TOSHIBA KK3 citations62
US7495293B2Feb 24, 2009
Semiconductor device and method for manufacturing the same
TOSHIBA KK2 citations62
US7768094B2Aug 3, 2010
Semiconductor integrated circuit and wafer having diffusion regions differing in thickness and method for manufacturing the same
TOSHIBA KK0 citations52
US7049222B2May 23, 2006
Semiconductor device having silicide film formed in a part of source-drain diffusion layers and method of manufacturing the same
TOSHIBA KK1 citations52
US7557040B2Jul 7, 2009
Method of manufacture of semiconductor device
TOSHIBA KK0 citations51
US7964906B2Jun 21, 2011
Semiconductor device and method of manufacturing same
TOSHIBA KK0 citations42
US7825433B2Nov 2, 2010
MIS-type semiconductor device
TOSHIBA KK0 citations42
US9660076B2May 23, 2017
Semiconductor memory device and method for manufacturing the same
TOSHIBA KK0 citations39
TOSHIBA MEMORY CORP
3 patentsUS10147736B2Dec 4, 2018
Semiconductor memory device and method for manufacturing same
TOSHIBA MEMORY CORP77 citations98
US9837430B2Dec 5, 2017
Semiconductor memory device and method for manufacturing same
TOSHIBA MEMORY CORP2 citations73
US9773712B2Sep 26, 2017
Ion implantation apparatus and semiconductor manufacturing method
TOSHIBA MEMORY CORP1 citations51