Inventor

BODE CHRISTOPHER A

US63 patents

⚠️ This page may combine multiple inventors who share the name “BODE CHRISTOPHER A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

BODE CHRISTOPHER A

ADVANCED MICRO DEVICES INC

Dynamic lot allocation based upon wafer state characteristics, and system for accomplishing same

Method for identifying and controlling impact of ambient conditions on photolithography processes

Dynamic process state adjustment of a processing tool to reduce non-uniformity

Method and apparatus for utilizing integrated metrology data as feed-forward data

Method and apparatus for run-to-run controlling of overlay registration

Identifying a cause of a fault based on a process controller output

Incorporation of critical dimension measurements as disturbances to lithography overlay run to run controller

Method and apparatus for modeling thickness profiles and controlling subsequent etch process

Method and apparatus for dynamic adjustment of a sensor sampling rate

Multi-level process data representation

Dispatch and/or disposition of material based upon an expected parameter result

Method and apparatus for determining a sampling plan based on process and equipment state information

Method and apparatus for cascade control using integrated metrology

Method and apparatus for determining control actions incorporating defectivity effects

Method and apparatus for implementing dynamic qualification recipes

Method and apparatus for modeling of batch dynamics based upon integrated metrology

Method and apparatus for determining a sampling plan based on defectivity

Method and apparatus for optimizing downstream uniformity

Method and apparatus for determining a sampling plan based on process and equipment fingerprinting

Method and apparatus for correlating error model with defect data

Method of using damaged areas of a wafer for process qualifications and experiments, and system for accomplishing same

Method and apparatus for dynamic model building based on machine disturbances for run-to-run control of semiconductor devices

Method for identifying and controlling impact of ambient conditions on photolithography processes

Method and apparatus for data stackification for run-to-run control

Method and apparatus for initializing tool controllers based on tool event data

Matching data related to multiple metrology tools

Method and apparatus for adaptively scheduling tool maintenance

Method for prioritizing production lots based on grade estimates and output requirements

Method and apparatus for controlling a tool using a baseline control script

Method and apparatus for performing run-to-run control in a batch manufacturing environment

Correlating an inline parameter to a device operation parameter

Method and apparatus for overlay control using multiple targets

Method and apparatus for dynamic adjustment of a sampling plan based on wafer electrical test data

Method and apparatus for controlling process target values based on manufacturing metrics

Prioritizing an application of correction in a multi-input control system

Method and apparatus for integrating multiple process controllers

Method and apparatus for controlling photolithography overlay registration incorporating feedforward overlay information

Method and apparatus for run-to-run controlling of overlay registration

Method and apparatus for fast disturbance detection and classification

Method and apparatus for providing excitation for a process controller

Method and apparatus for controlling the flow of wafers through a process flow

Method and apparatus for updating control state variables of a process control model based on rework data

Method and apparatus for distinguishing between sources of process variation

Tuning of a process control based upon layer dependencies

Method of using critical dimension measurements to control stepper process parameters

AMD INC

Method and apparatus for automated rework within run-to-run control semiconductor manufacturing

(unassigned)

Updating process controller based upon fault detection analysis

COSS JR ELFIDO

Associating data with workpieces and correlating the data with yield data

MILLER MICHAEL L

Method and apparatus for predicting device electrical parameters during fabrication

SONDERMAN THOMAS J

Process control using analysis of an upstream process