Inventor
YANG TA-HUNG
TW27 patents
⚠️ This page may combine multiple inventors who share the name “YANG TA-HUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MACRONIX INT CO LTD
20 patentsUS9236219B2Jan 12, 2016
Measurement of line-edge-roughness and line-width-roughness on pre-layered structures
MACRONIX INT CO LTD22 citations90
US5883001AMar 16, 1999
Integrated circuit passivation process and structure
MACRONIX INT CO LTD51 citations88
US7939451B2May 10, 2011
Method for fabricating a pattern
MACRONIX INT CO LTD8 citations83
US9905509B2Feb 27, 2018
Inverted-T shaped via for reducing adverse stress-migration effects
MACRONIX INT CO LTD7 citations78
US6875659B2Apr 5, 2005
Methods of code programming a mask ROM
MACRONIX INT CO LTD7 citations74
US10388664B2Aug 20, 2019
Integrated circuit device with layered trench conductors
MACRONIX INT CO LTD5 citations71
US6799152B1Sep 28, 2004
Critical dimension statistical process control in semiconductor fabrication
MACRONIX INT CO LTD7 citations68
US6864185B2Mar 8, 2005
Fine line printing by trimming the sidewalls of pre-developed resist image
MACRONIX INT CO LTD4 citations63
US10892265B2Jan 12, 2021
Word line structure and method of manufacturing the same
MACRONIX INT CO LTD0 citations62
US6821684B2Nov 23, 2004
Method for fabricating mask ROM with self-aligned coding
MACRONIX INT CO LTD2 citations62
US7648921B2Jan 19, 2010
Method of forming dielectric layer
MACRONIX INT CO LTD3 citations56
US6969642B2Nov 29, 2005
Method of controlling implantation dosages during coding of read-only memory devices
MACRONIX INT CO LTD4 citations54
US10497652B1Dec 3, 2019
Semiconductor substrate and semiconductor device
MACRONIX INT CO LTD0 citations52
US8034691B2Oct 11, 2011
HDP-CVD process, filling-in process utilizing HDP-CVD, and HDP-CVD system
MACRONIX INT CO LTD0 citations51
US7625819B2Dec 1, 2009
Interconnection process
MACRONIX INT CO LTD0 citations51
US7632616B2Dec 15, 2009
Controlling system and method for operating the same
MACRONIX INT CO LTD0 citations49
US9252153B1Feb 2, 2016
Method of word-line formation by semi-damascene process with thin protective conductor layer
MACRONIX INT CO LTD0 citations48
US7960835B2Jun 14, 2011
Fabrication of metal film stacks having improved bottom critical dimension
MACRONIX INT CO LTD0 citations47
US7846835B2Dec 7, 2010
Contact barrier layer deposition process
MACRONIX INT CO LTD0 citations41
US7786023B2Aug 31, 2010
Metal pad formation method and metal pad structure using the same
MACRONIX INT CO LTD0 citations40
LUOH TUUNG
4 patentsUS8519541B2Aug 27, 2013
Semiconductor device having plural conductive layers disposed within dielectric layer
LUOH TUUNG0 citations51
US8085390B2Dec 27, 2011
Multivariate monitoring method for plasma process machine
LUOH TUUNG0 citations50
US8520194B2Aug 27, 2013
Method of forming a deposited material by utilizing a multi-step deposition/etch/deposition (D/E/D) process
LUOH TUUNG0 citations48
US8184288B2May 22, 2012
Method of depositing a silicon-containing material by utilizing a multi-step fill-in process in a deposition machine
LUOH TUUNG0 citations38