Inventor
SALINAS MARTIN JEFFREY
US27 patents
⚠️ This page may combine multiple inventors who share the name “SALINAS MARTIN JEFFREY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
23 patentsUS7967996B2Jun 28, 2011
Process for wafer backside polymer removal and wafer front side photoresist removal
APPLIED MATERIALS INC16 citations84
US7552736B2Jun 30, 2009
Process for wafer backside polymer removal with a ring of plasma under the wafer
APPLIED MATERIALS INC9 citations84
US10204805B2Feb 12, 2019
Thin heated substrate support
APPLIED MATERIALS INC10 citations83
US7879183B2Feb 1, 2011
Apparatus and method for front side protection during backside cleaning
APPLIED MATERIALS INC13 citations83
US10566205B2Feb 18, 2020
Abatement and strip process chamber in a load lock configuration
APPLIED MATERIALS INC4 citations73
US9947559B2Apr 17, 2018
Thermal management of edge ring in semiconductor processing
APPLIED MATERIALS INC3 citations73
US11965241B2Apr 23, 2024
Cluster tools, systems, and methods having one or more pressure stabilization chambers
APPLIED MATERIALS INC2 citations68
US12094715B2Sep 17, 2024
Abatement and strip process chamber in a load lock configuration
APPLIED MATERIALS INC0 citations62
US11574831B2Feb 7, 2023
Method and apparatus for substrate transfer and radical confinement
APPLIED MATERIALS INC0 citations62
US11177136B2Nov 16, 2021
Abatement and strip process chamber in a dual loadlock configuration
APPLIED MATERIALS INC0 citations62
US11171008B2Nov 9, 2021
Abatement and strip process chamber in a dual load lock configuration
APPLIED MATERIALS INC1 citations62
US10943788B2Mar 9, 2021
Abatement and strip process chamber in a load lock configuration
APPLIED MATERIALS INC0 citations62
US12243761B2Mar 4, 2025
Detection and analysis of substrate support and pre-heat ring in a process chamber via imaging
APPLIED MATERIALS INC0 citations61
US10991552B2Apr 27, 2021
Cooling mechanism utilized in a plasma reactor with enhanced temperature regulation
APPLIED MATERIALS INC0 citations60
US9885567B2Feb 6, 2018
Substrate placement detection in semiconductor equipment using thermal response characteristics
APPLIED MATERIALS INC0 citations52
US9587789B2Mar 7, 2017
Methods and apparatus for providing a gas mixture to a pair of process chambers
APPLIED MATERIALS INC0 citations52
US9330887B2May 3, 2016
Plasma reactor with tiltable overhead RF inductive source
APPLIED MATERIALS INC0 citations52
US10249475B2Apr 2, 2019
Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation
APPLIED MATERIALS INC0 citations50
US9464732B2Oct 11, 2016
Apparatus for uniform pumping within a substrate process chamber
APPLIED MATERIALS INC1 citations50
US12428731B2Sep 30, 2025
Flow guide structures and heat shield structures, and related methods, for deposition uniformity and process adjustability
APPLIED MATERIALS INC0 citations49
US12467144B2Nov 11, 2025
Methods of correlating zones of processing chambers, and related systems and methods
APPLIED MATERIALS INC0 citations48
US12428753B2Sep 30, 2025
Lift assemblies, and related methods and components, for substrate processing chambers
APPLIED MATERIALS INC0 citations42
US12334318B2Jun 17, 2025
Plasma preclean system for cluster tool
APPLIED MATERIALS INC0 citations42