P

Inventor

KITAJIMA TOMOHIKO

US35 patents
⚠️ This page may combine multiple inventors who share the name “KITAJIMA TOMOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

34 patents
US10998329B2May 4, 2021

Methods and apparatus for three dimensional NAND structure fabrication

APPLIED MATERIALS INC11 citations85
US10886140B2Jan 5, 2021

3D NAND etch

APPLIED MATERIALS INC9 citations84
US10964717B2Mar 30, 2021

Methods and apparatus for three-dimensional NAND structure fabrication

APPLIED MATERIALS INC8 citations83
US9362186B2Jun 7, 2016

Polishing with eddy current feed meaurement prior to deposition of conductive layer

APPLIED MATERIALS INC10 citations83
US11930637B2Mar 12, 2024

Confined charge trap layer

APPLIED MATERIALS INC3 citations74
US11295786B2Apr 5, 2022

3D dram structure with high mobility channel

APPLIED MATERIALS INC5 citations73
US11818877B2Nov 14, 2023

Three-dimensional dynamic random access memory (DRAM) and methods of forming the same

APPLIED MATERIALS INC2 citations72
US9811077B2Nov 7, 2017

Polishing with pre deposition spectrum

APPLIED MATERIALS INC2 citations72
US10229842B2Mar 12, 2019

Double sided buff module for post CMP cleaning

APPLIED MATERIALS INC3 citations71
US12581637B2Mar 17, 2026

Methods and structures for three-dimensional dynamic random-access memory

APPLIED MATERIALS INC0 citations62
US12550317B2Feb 10, 2026

Direct word line contact and methods of manufacture for 3D memory

APPLIED MATERIALS INC0 citations62
US12538490B2Jan 27, 2026

Confined charge trap layer

APPLIED MATERIALS INC0 citations62
US12482749B2Nov 25, 2025

L-type wordline connection structure for three-dimensional memory

APPLIED MATERIALS INC0 citations62
US12408370B2Sep 2, 2025

Structure and fabrication method of high voltage MOSFET with a vertical drift region

APPLIED MATERIALS INC0 citations62
US12148475B2Nov 19, 2024

Selection gate separation for 3D NAND

APPLIED MATERIALS INC0 citations62
US11749315B2Sep 5, 2023

3D DRAM structure with high mobility channel

APPLIED MATERIALS INC0 citations62
US11594537B2Feb 28, 2023

3-d dram cell with mechanical stability

APPLIED MATERIALS INC0 citations62
US11587796B2Feb 21, 2023

3D-NAND memory cell structure

APPLIED MATERIALS INC0 citations62
US11574924B2Feb 7, 2023

Memory cell fabrication for 3D NAND applications

APPLIED MATERIALS INC0 citations62
US11545504B2Jan 3, 2023

Methods and apparatus for three dimensional NAND structure fabrication

APPLIED MATERIALS INC0 citations62
US11430801B2Aug 30, 2022

Methods and apparatus for three dimensional NAND structure fabrication

APPLIED MATERIALS INC0 citations62
US11189635B2Nov 30, 2021

3D-NAND mold

APPLIED MATERIALS INC0 citations62
US11158650B2Oct 26, 2021

Memory cell fabrication for 3D nand applications

APPLIED MATERIALS INC0 citations62
US12142475B2Nov 12, 2024

Sequential plasma and thermal treatment

APPLIED MATERIALS INC0 citations61
US11515170B2Nov 29, 2022

3D NAND etch

APPLIED MATERIALS INC0 citations61
US7101252B2Sep 5, 2006

Polishing method and apparatus

APPLIED MATERIALS INC5 citations58
US12444615B2Oct 14, 2025

Forming a doped hardmask

APPLIED MATERIALS INC0 citations57
US12592369B2Mar 31, 2026

Integrated method and tool for high quality selective silicon nitride deposition

APPLIED MATERIALS INC0 citations52
US12477723B2Nov 18, 2025

Three dimensional memory device and method of fabrication

APPLIED MATERIALS INC0 citations52
US12464716B2Nov 4, 2025

NAND cell structure with charge trap cut

APPLIED MATERIALS INC0 citations52
US12310014B2May 20, 2025

Selection gate separation for 3D NAND

APPLIED MATERIALS INC0 citations52
US11587930B2Feb 21, 2023

3-D DRAM structures and methods of manufacture

APPLIED MATERIALS INC0 citations52
US10651098B2May 12, 2020

Polishing with measurement prior to deposition of outer layer

APPLIED MATERIALS INC0 citations51
US12526971B2Jan 13, 2026

Reduced strain Si/SiGe heteroepitaxy stacks for 3D DRAM

APPLIED MATERIALS INC0 citations46

XU KUN

1 patent