Inventor
KITAJIMA TOMOHIKO
US35 patents
⚠️ This page may combine multiple inventors who share the name “KITAJIMA TOMOHIKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
34 patentsUS10998329B2May 4, 2021
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC11 citations85
US10886140B2Jan 5, 2021
3D NAND etch
APPLIED MATERIALS INC9 citations84
US10964717B2Mar 30, 2021
Methods and apparatus for three-dimensional NAND structure fabrication
APPLIED MATERIALS INC8 citations83
US9362186B2Jun 7, 2016
Polishing with eddy current feed meaurement prior to deposition of conductive layer
APPLIED MATERIALS INC10 citations83
US11930637B2Mar 12, 2024
Confined charge trap layer
APPLIED MATERIALS INC3 citations74
US11295786B2Apr 5, 2022
3D dram structure with high mobility channel
APPLIED MATERIALS INC5 citations73
US11818877B2Nov 14, 2023
Three-dimensional dynamic random access memory (DRAM) and methods of forming the same
APPLIED MATERIALS INC2 citations72
US9811077B2Nov 7, 2017
Polishing with pre deposition spectrum
APPLIED MATERIALS INC2 citations72
US10229842B2Mar 12, 2019
Double sided buff module for post CMP cleaning
APPLIED MATERIALS INC3 citations71
US12581637B2Mar 17, 2026
Methods and structures for three-dimensional dynamic random-access memory
APPLIED MATERIALS INC0 citations62
US12550317B2Feb 10, 2026
Direct word line contact and methods of manufacture for 3D memory
APPLIED MATERIALS INC0 citations62
US12538490B2Jan 27, 2026
Confined charge trap layer
APPLIED MATERIALS INC0 citations62
US12482749B2Nov 25, 2025
L-type wordline connection structure for three-dimensional memory
APPLIED MATERIALS INC0 citations62
US12408370B2Sep 2, 2025
Structure and fabrication method of high voltage MOSFET with a vertical drift region
APPLIED MATERIALS INC0 citations62
US12148475B2Nov 19, 2024
Selection gate separation for 3D NAND
APPLIED MATERIALS INC0 citations62
US11749315B2Sep 5, 2023
3D DRAM structure with high mobility channel
APPLIED MATERIALS INC0 citations62
US11594537B2Feb 28, 2023
3-d dram cell with mechanical stability
APPLIED MATERIALS INC0 citations62
US11587796B2Feb 21, 2023
3D-NAND memory cell structure
APPLIED MATERIALS INC0 citations62
US11574924B2Feb 7, 2023
Memory cell fabrication for 3D NAND applications
APPLIED MATERIALS INC0 citations62
US11545504B2Jan 3, 2023
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC0 citations62
US11430801B2Aug 30, 2022
Methods and apparatus for three dimensional NAND structure fabrication
APPLIED MATERIALS INC0 citations62
US11189635B2Nov 30, 2021
3D-NAND mold
APPLIED MATERIALS INC0 citations62
US11158650B2Oct 26, 2021
Memory cell fabrication for 3D nand applications
APPLIED MATERIALS INC0 citations62
US12142475B2Nov 12, 2024
Sequential plasma and thermal treatment
APPLIED MATERIALS INC0 citations61
US11515170B2Nov 29, 2022
3D NAND etch
APPLIED MATERIALS INC0 citations61
US7101252B2Sep 5, 2006
Polishing method and apparatus
APPLIED MATERIALS INC5 citations58
US12444615B2Oct 14, 2025
Forming a doped hardmask
APPLIED MATERIALS INC0 citations57
US12592369B2Mar 31, 2026
Integrated method and tool for high quality selective silicon nitride deposition
APPLIED MATERIALS INC0 citations52
US12477723B2Nov 18, 2025
Three dimensional memory device and method of fabrication
APPLIED MATERIALS INC0 citations52
US12464716B2Nov 4, 2025
NAND cell structure with charge trap cut
APPLIED MATERIALS INC0 citations52
US12310014B2May 20, 2025
Selection gate separation for 3D NAND
APPLIED MATERIALS INC0 citations52
US11587930B2Feb 21, 2023
3-D DRAM structures and methods of manufacture
APPLIED MATERIALS INC0 citations52
US10651098B2May 12, 2020
Polishing with measurement prior to deposition of outer layer
APPLIED MATERIALS INC0 citations51
US12526971B2Jan 13, 2026
Reduced strain Si/SiGe heteroepitaxy stacks for 3D DRAM
APPLIED MATERIALS INC0 citations46