P

Inventor

HSIEH CHING-PEI

TW28 patents
⚠️ This page may combine multiple inventors who share the name “HSIEH CHING-PEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

22 patents
US9431603B1Aug 30, 2016

RRAM device

TAIWAN SEMICONDUCTOR MFG CO LTD61 citations98
US9653682B1May 16, 2017

Resistive random access memory structure

TAIWAN SEMICONDUCTOR MFG CO LTD22 citations94
US10164184B2Dec 25, 2018

Resistance variable memory structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations84
US10158069B2Dec 18, 2018

Memory cell having resistance variable film and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US9853091B2Dec 26, 2017

Side bottom contact RRAM structure

TAIWAN SEMICONDUCTOR MFG CO LTD16 citations84
US9837605B2Dec 5, 2017

Memory cell having resistance variable film and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US9466794B2Oct 11, 2016

Low form voltage resistive random access memory (RRAM)

TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10516107B2Dec 24, 2019

Memory cell having resistance variable film and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10483322B2Nov 19, 2019

Memory device and method for fabricating the same

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10158073B2Dec 18, 2018

Manufacturing method of semiconductor structure

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9825224B2Nov 21, 2017

RRAM device

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9620582B2Apr 11, 2017

Metal-insulator-metal (MIM) capacitors and forming methods

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations73
US12020933B2Jun 25, 2024

Trench etching process for photoresist line roughness improvement

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations71
US11527406B2Dec 13, 2022

Trench etching process for photoresist line roughness improvement

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations71
US11018299B2May 25, 2021

Memory cell having resistance variable film and method of making the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US10957852B2Mar 23, 2021

Resistance variable memory structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12463035B2Nov 4, 2025

Trench etching process for photoresist line roughness improvement

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US10629811B2Apr 21, 2020

Resistance variable memory structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10164183B2Dec 25, 2018

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9837606B2Dec 5, 2017

Resistance variable memory structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9419218B2Aug 16, 2016

Resistance variable memory structure and method of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9406883B1Aug 2, 2016

Structure and formation method of memory device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52

TAIWAN SEMICONDUCTOR MFG

6 patents