Inventor
CHEN SHIH-SHIUNG
TW35 patents
⚠️ This page may combine multiple inventors who share the name “CHEN SHIH-SHIUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG CO LTD
18 patentsUS10510910B2Dec 17, 2019
Image sensor with an absorption enhancement semiconductor layer
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations84
US10157946B2Dec 18, 2018
Method for forming CMOS image sensor structure
TAIWAN SEMICONDUCTOR MFG CO LTD7 citations84
US9818779B2Nov 14, 2017
CMOS image sensor structure
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations84
US10211244B2Feb 19, 2019
Image sensor device with reflective structure and method for forming the same
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US9761546B2Sep 12, 2017
Trap layer substrate stacking technique to improve performance for RF devices
TAIWAN SEMICONDUCTOR MFG CO LTD5 citations83
US11996429B2May 28, 2024
CMOS image sensor structure with microstructures on backside surface of semiconductor layer
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US11177302B2Nov 16, 2021
CMOS image sensor structure with microstructures formed on semiconductor layer
TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US10861989B2Dec 8, 2020
Image sensor with an absorption enhancement semiconductor layer
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10861988B2Dec 8, 2020
Image sensor with an absorption enhancement semiconductor layer
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US9711521B2Jul 18, 2017
Substrate fabrication method to improve RF (radio frequency) device performance
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US11990493B2May 21, 2024
Image sensor device with reflective structure
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11342372B2May 24, 2022
Image sensor device with reflective layer
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11121100B2Sep 14, 2021
Trap layer substrate stacking technique to improve performance for RF devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11121098B2Sep 14, 2021
Trap layer substrate stacking technique to improve performance for RF devices
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US12453203B2Oct 21, 2025
Deep trench isolation structures resistant to cracking
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations61
US11302734B2Apr 12, 2022
Deep trench isolation structures resistant to cracking
TAIWAN SEMICONDUCTOR MFG CO LTD1 citations61
US10734427B2Aug 4, 2020
Method for forming image sensor device
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US12368070B2Jul 22, 2025
LDMOS device having isolation regions comprising DTI regions extending from a bottom of STI region
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
TAIWAN SEMICONDUCTOR MFG
17 patentsUS5705320AJan 6, 1998
Recovery of alignment marks and laser marks after chemical-mechanical-polishing
TAIWAN SEMICONDUCTOR MFG63 citations96
US6207546B1Mar 27, 2001
Prevent passivation from keyhole damage and resist extrusion by a crosslinking mechanism
TAIWAN SEMICONDUCTOR MFG25 citations92
US6021921AFeb 8, 2000
Liquid dispensing system and method for dispensing
TAIWAN SEMICONDUCTOR MFG45 citations92
US5989754ANov 23, 1999
Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
TAIWAN SEMICONDUCTOR MFG48 citations92
US5952132ASep 14, 1999
Method for forming a stepper focus pattern through determination of overlay error
TAIWAN SEMICONDUCTOR MFG39 citations92
US5567660AOct 22, 1996
Spin-on-glass planarization by a new stagnant coating method
TAIWAN SEMICONDUCTOR MFG27 citations86
US5869219AFeb 9, 1999
Method for depositing a polyimide film
TAIWAN SEMICONDUCTOR MFG17 citations84
US7204751B2Apr 17, 2007
Method and apparatus for filtering contaminants
TAIWAN SEMICONDUCTOR MFG11 citations81
US5999397ADec 7, 1999
Method for preventing electrostatic discharge damage to an insulating article
TAIWAN SEMICONDUCTOR MFG13 citations74
US5798192AAug 25, 1998
Structure of a mask for use in a lithography process of a semiconductor fabrication
TAIWAN SEMICONDUCTOR MFG13 citations72
US6752897B2Jun 22, 2004
Wet etch system with overflow particle removing feature
TAIWAN SEMICONDUCTOR MFG7 citations71
US7144673B2Dec 5, 2006
Effective photoresist stripping process for high dosage and high energy ion implantation
TAIWAN SEMICONDUCTOR MFG8 citations70
US6706601B1Mar 16, 2004
Method of forming tiny silicon nitride spacer for flash EPROM by using dry+wet etching technology
TAIWAN SEMICONDUCTOR MFG10 citations69
US7294279B2Nov 13, 2007
Method for releasing a micromechanical structure
TAIWAN SEMICONDUCTOR MFG2 citations61
US6687456B1Feb 3, 2004
In-line fluid heater
TAIWAN SEMICONDUCTOR MFG5 citations60
US6143644ANov 7, 2000
Method to prevent passivation from keyhole damage and resist extrusion
TAIWAN SEMICONDUCTOR MFG6 citations58
US6617221B1Sep 9, 2003
Method of making capacitors
TAIWAN SEMICONDUCTOR MFG1 citations46