Inventor
TAKEYAMA NAOKI
JP21 patents
Patents
21 patentsUS6656660B1Dec 2, 2003
Resist composition
SUMITOMO CHEMICAL CO56 citations92
US5876895AMar 2, 1999
Photosensitive resin composition for color filter
SUMITOMO CHEMICAL CO35 citations92
US5731110AMar 24, 1998
Photoresist composition for use in color filters
SUMITOMO CHEMICAL CO21 citations92
US6329119B1Dec 11, 2001
Negative type resist composition
SUMITOMO CHEMICAL CO15 citations90
US5585218ADec 17, 1996
Photoresist composition containing alkyletherified polyvinylphenol
SUMITOMO CHEMICAL CO24 citations90
US5985511ANov 16, 1999
Photoresist composition
SUMITOMO CHEMICAL CO6 citations73
US5846688ADec 8, 1998
Photoresist composition
SUMITOMO CHEMICAL CO6 citations73
US5686585ANov 11, 1997
Azo dyes for use in color filters and method for production of color filters
SUMITOMO CHEMICAL CO10 citations73
US5478680ADec 26, 1995
Color filter
SUMITOMO CHEMICAL CO17 citations73
US5420331AMay 30, 1995
Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
SUMITOMO CHEMICAL CO5 citations73
US5397679AMar 14, 1995
Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
SUMITOMO CHEMICAL CO8 citations73
US5362598ANov 8, 1994
Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye
SUMITOMO CHEMICAL CO7 citations73
US5304456AApr 19, 1994
Negative photoresist composition
SUMITOMO CHEMICAL CO17 citations73
US5614594AMar 25, 1997
Curable resin composition for overcoat film of color filter and color filter
SUMITOMO CHEMICAL CO7 citations72
US5198323AMar 30, 1993
Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component
SUMITOMO CHEMICAL CO7 citations72
US5965748AOct 12, 1999
Succinimide derivative, process for production and use thereof
SUMITOMO CHEMICAL CO2 citations62
US5800966ASep 1, 1998
Positive photoresist composition
SUMITOMO CHEMICAL CO3 citations62
US5395727AMar 7, 1995
Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol
SUMITOMO CHEMICAL CO5 citations62
US6280902B1Aug 28, 2001
Positive working photoresist compositions comprising a nitrogen-containing cyclic compound
SUMITOMO CHEMICAL CO3 citations61
US6156476ADec 5, 2000
Positive photoresist composition
SUMITOMO CHEMICAL CO5 citations60
USRE40964ENov 10, 2009
Negative type resist composition
SUMITOMO CHEMICAL CO0 citations49