Inventor
TANAKA ISSEY
JP13 patents
⚠️ This page may combine multiple inventors who share the name “TANAKA ISSEY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
12 patentsUS7505111B2Mar 17, 2009
Exposure apparatus and device manufacturing method
NIKON CORP140 citations99
US6583931B2Jun 24, 2003
Projection optical system, production method thereof, and projection exposure apparatus using it
NIKON CORP83 citations97
US6366404B1Apr 2, 2002
Projection optical system, production method thereof, and projection exposure apparatus using it
NIKON CORP93 citations97
US5719698AFeb 17, 1998
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP30 citations96
US7911582B2Mar 22, 2011
Exposure apparatus and device manufacturing method
NIKON CORP15 citations92
US6831731B2Dec 14, 2004
Projection optical system and an exposure apparatus with the projection optical system
NIKON CORP45 citations92
US6104544AAug 15, 2000
Exposure apparatus
NIKON CORP37 citations92
US5699183ADec 16, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP25 citations92
US6844915B2Jan 18, 2005
Optical system and exposure apparatus provided with the optical system
NIKON CORP10 citations74
US6181469B1Jan 30, 2001
Optical member for photolithography, method for evaluating optical member, and photolithography apparatus
NIKON CORP7 citations73
US6025955AFeb 15, 2000
Optical member for photolithography, method for evaluating optical member, and photolithography apparatus
NIKON CORP13 citations73
US6710930B2Mar 23, 2004
Illumination optical system and method of making exposure apparatus
NIKON CORP4 citations63